This article presents an interlaboratory comparison of multiline thru-reflect-line (mTRL) on-wafer calibrations on a commercial high-resistivity silicon (HRSi) substrate at D-band frequencies (110–170 GHz). Two national metrology institutes (KRISS and PTB) measured identical calibration structures using the same probe types and techniques, enabling an in-depth analysis of spatial measurement variation and reproducibility between laboratories. Overall, the results demonstrate high consistency with repeatable measurements achieved by different operators and over multiple months, showing negligible drift and affirming the stability of the calibration process. These findings demonstrate that, when best practices are followed, on-wafer calibrations on HRSi substrates can be reliably transferred between laboratories, with residual differences being attributable to known parasitic effects and boundary-condition influences.
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Rechteinformation
CC BY 4.0 ; Creative Commons Attribution 4.0 License
Themenbereich der Metrologie
Elektrizität und Magnetismus
Forschungsprojekt
This work was supported in part by the Development of Measurement Technology for High-Tech Strategic Industries through Korea Research Institute of Standards and Science under Grant KRISS – 2025 – GP2025- 0013 and in part by European Partnership on Metrology (EPM) 23IND10 OnMicro Project through European Partnership on Metrology, Co-Financed from European Union’s Horizon Europe Research and Innovation Program and by the Participating States.
Zitierung
Koo, H., Phung, G. N., Arz, U., Cho, C., & Kwon, J.-Y. (2025). Interlaboratory comparison of commercial high-resistivity silicon calibration substrate at D-band. IEEE Microwave and Wireless Technology Letters, 35(12), 2129–2132. https://doi.org/10.1109/LMWT.2025.3625538
