High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques [invited article]

Fernandez Herrero, Analía; Samadi, Nazanin; Sokolov, Andrey; Gwalt, Grzegorz; Rehbein, Stefan; Teichert, Anke; Ketelaars, Bas; Zonnevylle, Christiaan; Krist, Thomas; David, Christian; Siewert, Frank

doi:https://doi.org/10.1063/5.0293947

Zugriffsnummer	55320
Dokumenttyp	Konferenzartikel in Zeitschrift
Peer Review	mit Peer Review
Sprache	Englisch
Titel	High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques [invited article]
Autor(in); Institution	Fernandez Herrero, Analía; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin Samadi, Nazanin; Deutsches Elektronen-Synchrotron DESY 4 , GERMANY Sokolov, Andrey; Helmholtz Center Berlin for Materials and Energy, Berlin, GERMANY Gwalt, Grzegorz; Helmholtz Center Berlin for Materials and Energy, Berlin, GERMANY Rehbein, Stefan; Helmholtz Center Berlin for Materials and Energy, Berlin, GERMANY Teichert, Anke; NOB–Nano Optics, Berlin, GERMANY Ketelaars, Bas; RAITH B.V., Best, THE NETHERLANDS Zonnevylle, Christiaan; RAITH B.V., Best, THE NETHERLANDS Krist, Thomas; NOB–Nano Optics, Berlin, GERMANY David, Christian; Paul Scherrer Institut, Center for Photon Science, GERMANY Siewert, Frank; Helmholtz Center Berlin for Materials and Energy, Berlin, GERMANY
Quelle/Jahr	Review of Scientific Instruments: 96 (2025), 12, 121303-1 - 121303-10
Artikelnummer	121303
ISSN	0034-6748 (print) ; 1089-7623 (online)
DOI	https://doi.org/10.1063/5.0293947
URL	https://pubs.aip.org/aip/rsi/article-pdf/doi/10.1063/5.0293947/20828024/121303_1_5.0293947.pdf
Verlag	Melville, New York: AIP Publishing
Konferenzangaben	8th International Workshop on Metrology for X-ray Optics, Mirror Design and Fabrication, IWXM, Berlin, 02-05, September, 2024, Germany
Zusammenfassung	Maintaining the highest quality and output of photon science in the VUV-, EUV-, soft-, and tender-x-ray energy ranges requires high-quality blazed profile gratings. Currently, their availability is critical due to technological challenges and limited manufacturing resources. In this work, we show the developed method for manufacturing blazed gratings relevant for synchrotron-based science by means of electron-beam lithography (EBL). We investigate different parameters influencing the optical performance of blazed profile gratings and develop a robust process for the manufacturing of high-quality blazed gratings using polymethyl methacrylate as a high resolution positive tone resist and ion beam etching. Finally, we demonstrate excellent agreement in efficiency between the produced EBL grating and the theoretical prediction.

Kostenfreier Zugang	Open Access Hybrid
Rechteinformation	CC BY 4.0 ; Creative Commons Attribution 4.0 License

Themenbereich der Metrologie	Photometrie und Radiometrie
Förderinformationen (1)	Förderername: Horizon 2020 research and innovation programme

Zitierung

Fernandez Herrero, A., Samadi, N., Sokolov, A., Gwalt, G., Rehbein, S., Teichert, A., Ketelaars, B., Zonnevylle, C., Krist, T., David, C., & Siewert, F. (2025). High-quality blazed gratings through synergy between e-beam lithography and robust characterization techniques [invited article]. Review of Scientific Instruments, 96(12), 121303-1–121303-10. https://doi.org/10.1063/5.0293947

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