| Zugriffsnummer | 52828 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy |
| Autor(in); Institution |
Bogdanowicz, Janusz; Imec, Leuven, BELGIUM
Loo, Roger; Imec, Leuven, BELGIUM
Shimura, Yosuke; Imec, Leuven, BELGIUM; Ghent University, Department of Solid-State Sciences, Ghent, BELGIUM
Mani, Antonio; Imec, Leuven, BELGIUM
Mitterbauer, Christoph; Thermo Fisher Scientific, Eindhoven, THE NETHERLANDS
|
| Quelle/Jahr | Journal of Micro/Nanopatterning, Materials, and Metrology: 23 (2024), 4, 041405-1 - 041405-14 |
| Artikelnummer | 041405 |
| ISSN | 1932-5150 (print) ; 2708-8340 (online) |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Freie Schlagworte | EUV reflectometry ; scanning transmission electron microscopy and energy dispersive X-ray spectroscopy ; SiGe ; interface sharpness ; layer intermixing |
| Zusammenfassung | Background: A key element of semiconductor fabrication is the precise deposition of thin films. Among other aspects, the quality of interfaces between different materials plays a crucial role for the success of further processing steps. Aim: We here present a combined quantitative study of soft X-ray reflectometry measurements compared to scanning transmission electron microscopy and energy dispersive X-ray spectroscopy (STEM-EDX) on stacked thin film samples of silicon and silicon-germanium (SiGe). Approach: The thin film structures feature two distinct germanium concentrations in the SiGe layers and are produced for complementary field-effect transistor applica |
| Kostenfreier Zugang | Open Access Hybrid |
| Rechteinformation | CC BY 4.0 ; Creative Commons Attribution 4.0 License |
| Themenbereich der Metrologie | Photometrie und Radiometrie |
Zitierung
Ciesielski, R., Bogdanowicz, J., Loo, R., Shimura, Y., Mani, A., Mitterbauer, C., Kolbe, M., & Soltwisch, V. (2024). Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy. Journal of Micro/Nanopatterning, Materials, and Metrology, 23(4), 041405-1–041405-14. https://doi.org/10.1117/1.JMM.23.4.041405