| Zugriffsnummer | 51158 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Progress in nanometrology: reduction of measurement uncertainty of step height and etching depth calibration down to 0.3 nm |
| Autor(in); Institution |
Hu, Xiukun; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
|
| Quelle/Jahr | Proceedings of the 22nd International Conference of the European Society for Precision Engineering and Nanotechnology : 30th May-3rd June 2022, Geneva, CH : conference proceedings:(2022), 441 - 444 |
| Herausgeber(in) |
Leach, R. K.
|
| ISBN | 978-1-9989991-1-8 (print) |
| Verlag | Bedford: euspen |
| Konferenzangaben | 22nd International Conference & Exhibition, Geneva, 30, May - 03, June, 2022, Switzerland |
| Freie Schlagworte | Dimensional nanometrology ; traceable calibration ; metrological atomic force microscopy ; interferometry ; nonlinearity correction ; step height |
| Zusammenfassung | Metrological atomic force microscopes (Met. AFM) are one of the most widely used metrology tools for accurate and traceable calibrations of various nanoscale standards, which is a crucial task for developing innovative nanotechnologies. However, experimental studies show that the interferometers embedded in the Met. AFM suffer from high order nonlinearity error, which cannot be corrected by the conventional Heydemann method. To overcome this challenging issue, this paper introduces a new approach for correcting the high order nonlinearity errors by using external sensors/standards, which is feasible to correct the nonlinearity error down to 40 pm. Furthermore, the propagation of the (residual) nonlinearity error for the step height calibration is introduced. Finally, the metrology performance of the state-of-the-art Met. AFM at the PTB in the calibration of a highly demanding industrial sample is illustrated. The standard deviation of 6 sets of reproducible measurements reaches 0.02 nm and its expanded measurement uncertainty is estimated as 0.3 nm. This demonstrates a significant progress in dimensional nanometrology. |
