| Zugriffsnummer | 50987 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | D-band characterization of a commercial high-resistivity Silicon calibration substrate |
| Autor(in); Institution |
Koo, Hyunji; Korea Research Institute of Standards and Science (KRISS), Electromagnetic Wave Metrology Group, Daejeon, SOUTH KOREA
Cho, Chihyun; Korea Research Institute of Standards and Science (KRISS), Electromagnetic Wave Metrology Group, Daejeon, SOUTH KOREA
Kwon, Jae-Yong; Korea Research Institute of Standards and Science (KRISS), Electromagnetic Wave Metrology Group, Daejeon, SOUTH KOREA
|
| Quelle/Jahr | 2023 101st ARFTG Microwave Measurement Conference (ARFTG):(2023), 40 - 43 |
| ISSN | 2767-8776 ; 2836-1407 (PoD) |
| ISBN | 979-8-3503-2345-0 ; 979-8-3503-2346-7 (PoD) |
| DOI | |
| Verlag | Piscataway, NJ: IEEE |
| Konferenzangaben | 2023 101st ARFTG Microwave Measurement Conference (ARFTG), San Diego, 16, June, 2023, USA |
| Freie Schlagworte | coplanar waveguides ; calibration ; on-wafer measurements ; probes ; standards |
| Zusammenfassung | Silicon (Si) is one of the most important materials used in many RF applications. On-wafer characterization of Si-based devices, components and circuits is widely adopted. Recent investigations have been devoted to the study of parasitic probe and neighborhood effects in commercial alumina-based calibration substrates. However, these parasitic effects have not been thoroughly investigated for commercial silicon-based calibration substrates. Therefore, this paper presents a detailed study of a commercial high-resistivity silicon (HRSi) calibration substrate. The neighborhood effect in conjunction with probe influences is investigated up to D-band frequencies. |
| Themenbereich der Metrologie | Elektrizität und Magnetismus |
| Forschungsprojekt | 20IND03: FutureCom: RF Measurements for future communications applications |
| Förderinformationen (1) |
Förderername: European Commission (EC)
Förderer ID: 0000 0001 2242 8989 Förderer ID Typ: ISNI Förderprogramm: EMPIR 2020 Industry Titel der Förderung: 20IND03: FutureCom: RF Measurements for future communications applications Förderungsnummer: 20IND03 |
Zitierung
Phung, G. N., Koo, H., Cho, C., Kwon, J.-Y., & Arz, U. (2023). D-band characterization of a commercial high-resistivity Silicon calibration substrate. 2023 101st ARFTG Microwave Measurement Conference (ARFTG), San Diego, 16, June, 2023, USA. https://doi.org/10.1109/ARFTG57476.2023.10279693