| Zugriffsnummer | 50517 |
| Dokumenttyp | Buchartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Synchrotron-based metrology tools for EUV lithography [Chapter 17] |
| Autor(in); Institution |
Tarrio, C.; NIST National Institute of Standards and Technology, Gaithersburg, USA
Vest, R.; NIST National Institute of Standards and Technology, Gaithersburg, USA
Ekinci, Y.; PSI Paul Scherrer Institut, Villigen, Switzerland
|
| Quelle/Jahr | Photon Sources for Lithography and Metrology:(2023), 677 - 745 |
| Herausgeber(in) |
Bakshi, Vivek
|
| ISBN | 978-1-510-65371-9 (print) ; 978-1-510-65372-6 (PDF) |
| URL | |
| Verlag | Bellingham, Wash.: SPIE |
| Zusammenfassung | This chapter gives an overview of the measurement capabilities of NIST and PTB and presents the status of the calibration of optics and detectors and calibration tools for EUV source metrology. EUV metrology capabilities are also provided elsewhere, e.g., at the Center for X-ray Optics (CXRO) of the Advanced Light Source (ALS) storage ring; by Paul Scherrer Institute (PSI) at the Swiss Light Source (SLS) in Switzerland; and in Japan by LASTI at the NewSUBARU storage ring. |
| Themenbereich der Metrologie | Photometrie und Radiometrie |