| Zugriffsnummer | 49285 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation |
| Autor(in); Institution |
Glabisch, Sven; RWTH Aachen University, GERMANY
Schröder, Sophia; RWTH Aachen University, GERMANY
Brose, Sascha; RWTH Aachen University, GERMANY
|
| Quelle/Jahr | Applied Optics: 62 (2023), 1, 117 - 132 |
| ISSN | 1559-128X (PRINT) ; 2155-3165 (ONLINE) |
| DOI | |
| Verlag | Washington, D.C.: Optica Publishing Group |
| Zusammenfassung | Modern semiconductor structures reach sizes in the nanometer regime. Optical metrology characterizes test structures for the quality assessment of semiconductor fabrication. The limits of radiation to resolve nanometer structure sizes can be overcome by shortening the wavelength. The compact source extreme ultraviolet (EUV) scatterometer presented here characterizes samples in the EUV spectral range using plasma radiation. Reference measurements with synchrotron radiation are carried out using a beamline scatterometer. A comparison including Markov chain Monte Carlo sampling shows that the compact source and beamline setups can both determine the given dimensional parameters of a nanoscale grating with uncertainties in the sub-nanometer range. Grating characterization based on soft x ray scattering has increased accuracy. |
| Themenbereich der Metrologie | Photometrie und Radiometrie |
| Forschungsprojekt | H2020 Leadership in Enabling and Industrial Technologies (875999); European Metrology Programme for Innovation and Research (20IND04). |
Zitierung
Lohr, L. M., Ciesielski, R., Glabisch, S., Schröder, S., Brose, S., & Soltwisch, V. (2023). Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation. Applied Optics, 62(1), 117–132. https://doi.org/10.1364/AO.475566