A study of micro-structure edges with atomic force microscopy and implications for optical metrology

Geuther, Heinrich; Mirandé, Werner; Schröder, Klaus-Peter

doi:https://doi.org/10.1016/0167-9317(94)90184-8

Zugriffsnummer	49191
Dokumenttyp	Konferenzartikel in Zeitschrift
Peer Review	unbekannt
Sprache	Englisch
Titel	A study of micro-structure edges with atomic force microscopy and implications for optical metrology
Autor(in); Institution	Geuther, Heinrich; 4.22, Bildanalyse, PTB-Braunschweig Mirandé, Werner; 4.22, Bildanalyse, PTB-Braunschweig Schröder, Klaus-Peter; 4.22, Bildanalyse, PTB-Braunschweig
Quelle/Jahr	Microelectronic Engineering: 23 (1994), 1-4, 407 - 410
ISSN	0167-9317 (PRINT)
DOI	https://doi.org/10.1016/0167-9317(94)90184-8
Verlag	Amsterdam [u.a.]: Elsevier
Konferenzangaben	International Conference on Microfabrication, Maastricht, 26-29, September, 1993, The Netherlands
Zusammenfassung	Microstructures on photomasks and Si-wafers have been studied by means of optical and atomic force microscopy (AFM). We present examples for relations between edge topography and optical properties, which are relevant to optical metrology.

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Geuther, H., Mirandé, W., & Schröder, K.-P. (1994). A study of micro-structure edges with atomic force microscopy and implications for optical metrology. Microelectronic Engineering, 23(1-4), 407–410. https://doi.org/10.1016/0167-9317(94)90184-8

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