| Zugriffsnummer | 48530 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Coating process parameter influence on thin films for the ATHENA x-ray optics |
| Autor(in); Institution |
Massahi, Sonny; DTU Space, Technical University of Denmark, Lyngby, DENMARK
Ferreira, Desirée Della Monica; DTU Space, Technical University of Denmark, Lyngby, DENMARK
Christensen, Finn E.; DTU Space, Technical University of Denmark, Lyngby, DENMARK
Svendsen, Sara; DTU Space, Technical University of Denmark, Lyngby, DENMARK
Gellert, N.; DTU Space, Technical University of Denmark, Lyngby, DENMARK
Jegers, A. S.; DTU Space, Technical University of Denmark, Lyngby, DENMARK
Collon, Maximilien J.; cosine Research B.V., Warmond, THE NETHERLANDS
Landgraf, Boris; cosine Research B.V., Warmond, THE NETHERLANDS
Thete, A.; cosine Research B.V., Warmond, THE NETHERLANDS
Ferreira, Ivo; European Space Agency, ESTEC, Noordwijk, THE NETHERLANDS
Bavdaz, Marcos; European Space Agency, ESTEC, Noordwijk, THE NETHERLANDS
Shortt, Brian; European Space Agency, ESTEC, Noordwijk, THE NETHERLANDS
Schönberger, W.; Von Ardenne GmbH, Dresden, GERMANY
Langer, A.; Von Ardenne GmbH, Dresden, GERMANY
Handick, Evelyn; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray:(2022), 121814F-1 - 121814F-11 |
| Artikelnummer | 121814F |
| Schriftenreihe | Proceedings of SPIE: 12181 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE Astronomical Telescopes + Instrumentation, Montréal, Québec, 17-23, July, 2022, Canada |
| Freie Schlagworte | Coating ; Iridium ; Thin films ; Silicon ; Thin film coatings ; Boron ; Data modeling ; Chemical species ; Thin film deposition ; Silicon films |
| Zusammenfassung | The thin film deposition technology for fabrication of the mirror optics for the Advanced Telescope for HighEnergy Astrophysics (ATHENA) has been established. Numerous coating process parameters impact the quality of the thin films. Defining a margin within the coating process parameter space, where the deposited thin film performs similar in X-ray reflectivity is key to avoid unforeseen risks within the coating process for the ATHENA flight optics production. In this work, we investigate the coating process parameter influence on the thin film properties with a focus on micro roughness, deposition rate and residual film stress when deposited under various process conditions. The thin films were produced by varying the following three coating process parameters: discharge power, discharge voltage and working gas pressure. The thin films were characterized using X–ray reflectometry at 3.4–10.0 keV. A main result of this work is that the residual stress of single layer iridium and boron carbide films can be reduced by a factor of approximately two, by increasing the working gas pressure while maintaining a high film quality. |
| Themenbereich der Metrologie | Photometrie und Radiometrie |
Zitierung
Massahi, S., Ferreira, D. D. M., Christensen, F. E., Svendsen, S., Gellert, N., Jegers, A. S., Collon, M. J., Landgraf, B., Thete, A., Ferreira, I., Bavdaz, M., Shortt, B., Schönberger, W., Langer, A., Krumrey, M., Gollwitzer, C., & Handick, E. (2022). Coating process parameter influence on thin films for the ATHENA x-ray optics. SPIE Astronomical Telescopes + Instrumentation, Montréal, Québec, 17-23, July, 2022, Canada. https://doi.org/10.1117/12.2630726