| Zugriffsnummer | 44766 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices |
| Autor(in); Institution |
Grunewald, Tobias; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Wurm, Matthias; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Teichert, Sven; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Reck, Johanna; SENTECH Instruments GmbH, Berlin, GERMANY
Richter, Uwe; SENTECH Instruments GmbH, Berlin, GERMANY
|
| Quelle/Jahr | Measurement Science and Technology: 31 (2020), 11, 1 - 9 |
| ISSN | 0957-0233 (PRINT) ; 1361-6501 (ONLINE) |
| DOI | |
| Verlag | Bristol: IOP Publishing |
| Konferenzangaben | NanoScale 2019 - 12th Seminar on Quantitative Microscopy (QM) & 8th Seminar on Nanoscale Calibration, Standards and Methods, Braunschweig, 15-16, October, 2019, Deutschland |
| Freie Schlagworte | gratings ; layer thickness ; Mueller matrix ellipsometry ; merrit function ; Bayes ; parameter reconstruction ; depolarisation |
| Zusammenfassung | For the analysis of measured data in spectroscopic Mueller ellipsometry (SME) there exist some commonly used optimization techniques to calculate for example layer thicknesses of samples under test. Concentrating on metrological aspects of SME we identified a non-optimal treatment of depolarization in all these techniques. Therefore, we recently developed an improved optimization method to take adequately into account depolarization in Mueller matrix ellipsometry (MME). In a further step we also included statistical measurement noise and derived a likelihood function, which enabled us to apply both the maximum likelihood method, Bayesian statistics and the Bayesian information criterion for the data evaluation. In this paper we concentrate on the application of that new method for calculating SiO2-layer thicknesses on Silicon. For that purpose with a state-of-the-art SENTECH SENresearch 4.0 MME we measured different SiO2-layer thickness standard samples with nominal thicknesses between 6 nm and 1000 nm, which have been calibrated by X-ray reflectometry (XRR) at PTB. The MME results are compared to the calibration data. For all samples an SiO2-SiO-Si model turned out to be optimal. The measured oxid layer thicknesses match excellently with the calibration values within the declared uncertainties. All results are presented here. It is a first comparison with traceable reference measurements demonstrating the validity of our novel MME analysis method. |
| Kostenfreier Zugang | Open Access Hybrid |
| Rechteinformation | CC BY 4.0 ; Creative Commons Attribution 4.0 License |
| Themenbereich der Metrologie | Photometrie und Radiometrie |
Zitierung
Grunewald, T., Wurm, M., Teichert, S., Bodermann, B., Reck, J., & Richter, U. (2020). Measurement of layer thicknesses with an improved optimization method for depolarizing Mueller matrices. Measurement Science and Technology, 31(11), 1–9. https://doi.org/10.1088/1361-6501/ab95da