| Zugriffsnummer | 44155 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Sensitivity analysis for the detection of pitchwalk in self-aligned quadruple patterning by GISAXS |
| Autor(in); Institution |
Casfor Zapata, Maren; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Farchmin, Nando; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Pflüger, Mika; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Nikolaev, Konstantin; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Soltwisch, Victor; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Heidenreich, Sebastian; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Laubis, Christian; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Kolbe, Michael; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Metrology, Inspection and Process Control for Microlithography XXXIV:(2020), 10 S. |
| Artikelnummer | 113251D |
| Schriftenreihe | Proceedings of SPIE: 11325 |
| ISSN | 0277-786X |
| ISBN | 978-1-5106-3417-6 (print) ; 978-1-5106-3418-3 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE Advanced Lithography 2020, San José, Calif., 23-27, February, 2020, USA |
| Freie Schlagworte | X-ray scattering ; FEM ; GISAXS ; polynomial chaos ; pitchwalk |
| Zusammenfassung | Recent studies for profile reconstructions of nanostructures produced with self-aligned quadruple patterning (SAQP) indicate the limits for solving the inverse problem with a rigorous simulation. Using Monte Carlo methods for the theoretical investigation of the observed pitchwalk behaviour is not feasible due to the high computational cost of simulating GISAXS measurements by solving Maxwell’s equations with an FEM approach for each proposed structural model. We will show that a surrogate model based on a polynomial chaos expansion is a versatile tool to reduce the computational effort significantly. The expansion provides not only a surrogate for the forward model, but also Sobol indices for a global sensitivity analysis. This enables the study of the sensitivities in GISAXS in detail. |
Zitierung
Casfor Zapata, M., Farchmin, N., Pflüger, M., Nikolaev, K., Soltwisch, V., Heidenreich, S., Laubis, C., Kolbe, M., & Scholze, F. (2020). Sensitivity analysis for the detection of pitchwalk in self-aligned quadruple patterning by GISAXS. SPIE Advanced Lithography 2020, San José, Calif., 23-27, February, 2020, USA. https://doi.org/10.1117/12.2552037