| Zugriffsnummer | 44086 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Interferometric and deflectometric flatness metrology with nanometre measurement uncertainties for optics up to 1 metre at PTB |
| Autor(in); Institution |
Ehret, Gerd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Reinsch, Heiko; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Schulz, Michael; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
|
| Quelle/Jahr | Optical Metrology and Inspection for Industrial Applications VI: 11189 (2019) |
| Schriftenreihe | Proceedings of SPIE: 11189 |
| ISSN | 0277-786X (PRINT) ; 1996-756X (ELECTRONIC) |
| ISBN | 978-1-5106-3095-6 (print) ; 978-1-5106-3096-3 (electronic) |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE/COS Photonics Asia, 2019, Hangzhou, China Optical Metrology and Inspection for Industrial Applications VI;, Hangzhou, 20-23, October, 2019, China |
| Freie Schlagworte | deflectometry ; small angle deflectometry ; interferometry ; flatness metrology ; traceability ; measurement uncertainty |
| Zusammenfassung | High-precision topography measurements of nearly flat specimens with nanometre uncertainty are still demanding. They are needed for synchrotron or other high-quality optical mirrors. At the Physikalisch-Technische Bundesanstalt (PTB), we operate an interferometric setup and a small-angle deflectometric setup for flatness measurement. We present both systems, show the measurement uncertainties and discuss the pros and cons of interferometric and gradient based measurement systems. To achieve the nanometre level in flatness metrology, the environmental conditions and the holder of the specimen are very important. We show measurements of topography changes due to delayed elasticity effects. We demonstrate current developments with the small-angle deflectometer, especially to improve the lateral resolution. |
| Themenbereich der Metrologie | Länge, dimensionelle Metrologie |
Zitierung
Ehret, G., Reinsch, H., & Schulz, M. (2019). Interferometric and deflectometric flatness metrology with nanometre measurement uncertainties for optics up to 1 metre at PTB. SPIE/COS Photonics Asia, 2019, Hangzhou, China Optical Metrology and Inspection for Industrial Applications VI;, Hangzhou, 20-23, October, 2019, China. https://doi.org/10.1117/12.2538872