| Zugriffsnummer | 43864 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Extracting dimensional parameters of gratings produced with self-aligned multiple patterning using grazingincidence small-angle x-ray scattering |
| Autor(in); Institution |
Pflüger, Mika; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Kline, R. Joseph; National Institute of Standards and Technology, Materials Measurement Laboratory, Gaithersburg, Maryland, UNITED STATES OF AMERICA
Fernández Herrero, Analía; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Hammerschmidt, Martin; JCMwave GmbH, Berlin, GERMANY
Soltwisch, Victor; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Krumrey, Michael; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Journal of Micro/Nanolithography, MEMS and MOEMS: 19 (2020), 1, 014001-1 - 014001-16 |
| ISSN | 1932-5150 (PRINT) ; 1932-5134 (ONLINE) |
| DOI | |
| URL | |
| Verlag | Bellingham, Wash.: SPIE |
| Zusammenfassung | Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-angle x-ray scattering (GISAXS) is being considered because measurements are fast with a proven capability to reconstruct average grating line profiles with high accuracy. Aim: GISAXS measurements of grating line shapes should be extended to samples with pitches smaller than 50 nm and their defects. The method’s performance should be evaluated. Approach: A series of gratings with 32-nm pitch and deliberately introduced pitchwalk is measured using GISAXS. The grating line profiles with associated uncertainties are reconstructed using a Maxwell solver and Markov-chain Monte Carlo sampling combined with a simulation library approach. Results: The line shape and the pitchwalk are generally in agreement with previously published transmission small-angle x-ray scattering (SAXS) results. However, the line height and line width show deviations of ( 1.0 ± 0.2 ) nm and ( 2.0 ± 0.7 ) nm, respectively. The complex data evaluation leads to relatively high pitchwalk uncertainties between 0.5 and 2 nm. Conclusions: GISAXS shows great potential as a metrology tool for small-pitch line gratings with complex line profiles. Faster simulation methods would enable more accurate results. Data and program code publication: https://doi.org/10.24433/CO.0953516.v1 |
| Themenbereich der Metrologie | Photometrie und Radiometrie |
Zitierung
Pflüger, M., Kline, R. J., Fernández Herrero, A., Hammerschmidt, M., Soltwisch, V., & Krumrey, M. (2020). Extracting dimensional parameters of gratings produced with self-aligned multiple patterning using grazingincidence small-angle x-ray scattering. Journal of Micro/Nanolithography, MEMS and MOEMS, 19(1), 014001-1–014001-16. https://doi.org/10.1117/1.jmm.19.1.014001