| Zugriffsnummer | 43832 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | High precision x-ray metrology |
| Autor(in); Institution |
Seyfried, Peter; 5.1, Mikrometrologie, PTB-Braunschweig
Becker, Peter; 6.13, Röntgenmetrologie, PTB-Braunschweig
Windisch, Dietmar; 6.13, Röntgenmetrologie, PTB-Braunschweig
|
| Quelle/Jahr | Precision Engineering: 10 (1988), 1, 35 - 42 |
| Artikelnummer | 010035-08 |
| ISSN | 0141-6359 |
| Verlag | Guildford: Butterworth Scientific Ltd. |
| Freie Schlagworte | x-ray interferometry ; metrology ; silicon crystals |
| Zusammenfassung | Highly pure silicon crystals with almost perfect lattice structure constitute a powerful metrological tool. Lattice spacings of the order of 0.1 nm are reproduced by nature to better than 1 part in 107 . These have been applied as length standards in the sub-nanometre region using the scanning x-ray interferometer. Crystallographic angles between different sets of lattice planes within the same crystal differ only very little (1 .times 10.sup-9 rad) from values calculated for the perfect crystal. Double-crystal x-ray diffraction has been used to provide a single-crystal polygon. |
