| Zugriffsnummer | 42996 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | X-ray testing of silicon pore optics |
| Autor(in); Institution |
Vacanti, Giuseppe; cosine measurement systems, THE NETHERLANDS
Barrière, Nicolas M.; cosine measurement systems, THE NETHERLANDS
Collon, Maximilien J.; cosine measurement systems, THE NETHERLANDS
Hauser, Enrico; cosine measurement systems, THE NETHERLANDS
Babic, Ljubisa; cosine measurement systems, THE NETHERLANDS
Bayerle, Alex; cosine measurement systems, THE NETHERLANDS
Girou, David; cosine measurement systems, THE NETHERLANDS
Günther, Ramses; cosine measurement systems, THE NETHERLANDS
Keek, Laurens; cosine measurement systems, THE NETHERLANDS
Landgraf, Boris; cosine measurement systems, THE NETHERLANDS
Okma, Ben; cosine measurement systems, THE NETHERLANDS
Verhoeckx, Sjoerd; cosine measurement systems, THE NETHERLANDS
Vervest, Mark; cosine measurement systems, THE NETHERLANDS
Voruz, Luc; cosine measurement systems, THE NETHERLANDS
Bavdaz, Marcos; European Space Agency, Noordwijk, THE NETHERLANDS
Wille, Eric; European Space Agency, Noordwijk, THE NETHERLANDS
Krumrey, Michael; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Müller, Peter; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Handick, Evelyn; 7.2, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX:(2019), 111190I-1 - 111190I-10 |
| Schriftenreihe | Proceedings of SPIE: 11119 |
| Availability | [online only] |
| Herausgeber(in) |
O'Dell, Stephen L.
Pareschi, Giovanni
|
| ISSN | 0277-786X (PRINT) ; 1996-756X (ONLINE) |
| ISBN | 978-1-5106-2932-5 ; 978-1-5106-2931-8 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, San Diego, California, 13-15, August, 2019, United States of America |
| Zusammenfassung | Silicon Pore Optics are the X-ray mirror technology selected for the Athena X-ray observatory. We describe the X-ray testing and characterization cycle that the optics are subjected to at the PTB's XPBF 1 and 2 beamlines at the synchrotron radiation facility BESSY II. Individual stacks are measured with a pencil beam to determine optical quality and orientation of the optical axis. Using metrics based on X-ray and manufacturing metrology, stacks are then paired in primary-secondary Wolter-I-like systems, that are in turn characterized to determine their optical performance. Finally, four stacks, two primaries and two secondaries, are bonded into a mirror module, that is also characterized, with pencil and wide X-ray beams. At each step models, metrology, and software are combined to arrive at the relevant parameters. We describe the methods used, and illustrate them with some of the results obtained recently. |
| Themenbereich der Metrologie | Photometrie und Radiometrie |
Zitierung
Vacanti, G., Barrière, N. M., Collon, M. J., Hauser, E., Babic, L., Bayerle, A., Girou, D., Günther, R., Keek, L., Landgraf, B., Okma, B., Verhoeckx, S., Vervest, M., Voruz, L., Bavdaz, M., Wille, E., Krumrey, M., Müller, P., & Handick, E. (2019). X-ray testing of silicon pore optics. Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, San Diego, California, 13-15, August, 2019, United States of America. https://doi.org/10.1117/12.2530977