| Zugriffsnummer | 41880 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Peak and integrated reflectivity, wavelength and Gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography |
| Autor(in); Institution |
Stuik, R.; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Louis, E.; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Yakshin, A. E.; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Görts, P. C.; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Maas, E. L. G.; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Bijkerk, F.; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, THE NETHERLANDS
Schmitz, Detlef; 7.1, Photonenradiometrie, PTB-Berlin
Scholze, Frank; 7.1, Photonenradiometrie, PTB-Berlin
Ulm, Gerhard; 7.1, Photonenradiometrie, PTB-Berlin
Haidl, M.; Carl Zeiss, Oberkochen, GERMANY
|
| Quelle/Jahr | Journal of Vacuum Science and Technology B: 17 (1999), 6, 2998 - 3002 |
| ISSN | 0734-211X |
| DOI | |
| Verlag | New York, NY: AIP |
| Zusammenfassung | Reported is the optimization of the fabrication of Mo/Si multilayer systems produced by e-beam evaporation and ion-beam smoothening. The impact of a number of coating parameters is verified such as variation of the mirror’s center wavelength and the metal fraction of the bilayer (Γ ratio), resulting in reflectivities up to 68.6% at normal incidence. Parallel to this experimental work, a numerical optimization based on experimentally determined multilayer properties is carried out on the throughput of multimirror lithographic systems for the 11–15 nm wavelength region using Mo/Si and Mo/Be coatings. The center wavelength, Γ ratio and layer stack have been optimized. The calculations show an optimum throughput for a 10-mirror Mo/Si system at 14.4 nm, assuming a light source with a wavelength independent spectrum. |
Zitierung
Stuik, R., Louis, E., Yakshin, A. E., Görts, P. C., Maas, E. L. G., Bijkerk, F., Schmitz, D., Scholze, F., Ulm, G., & Haidl, M. (1999). Peak and integrated reflectivity, wavelength and Gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography. Journal of Vacuum Science and Technology B, 17(6), 2998–3002. https://doi.org/10.1116/1.590942