| Zugriffsnummer | 40735 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Determination of soft X-ray emission of pulsed plasma sources by comparison with the calculable emission of an electron storage ring using X-ray lithographic exposures |
| Autor(in); Institution |
Petzold, H. C.; Fraunhofer-Institut für Mikrostrukturtechnik, Berlin, GERMANY
Kühne, Michael; 9.23, Vakuum-UV-Strahlungsmesstechnik, PTB-Berlin
|
| Quelle/Jahr | Microelectronic Engineering: 10 (1989), 41 - 47 |
| ISSN | 0167-9317 |
| DOI | |
| Verlag | Amsterdam: Elsevier |
| Zusammenfassung | A method is described to determine the soft X-ray emission of pulsed plasma sources for X-ray lithography. It is based on a comparison between resist exposures to the plasma sources under investigation and to synchrotron radiation from the electron storage ring BESSY. The method was applied to laser produced plasmas which were generated by laser radiation pulses of different laser wavelengths and pulse energies. |
Zitierung
Petzold, H. C. & Kühne, M. (1989). Determination of soft X-ray emission of pulsed plasma sources by comparison with the calculable emission of an electron storage ring using X-ray lithographic exposures. Microelectronic Engineering, 10, 41–47. https://doi.org/10.1016/0167-9317(89)90140-8