| Zugriffsnummer | 40684 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Reducing Rowland ghosts in diffraction gratings by dynamic exposure near-field holography |
| Autor(in); Institution |
Lin, Dakui; National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, CHINA
Chen, Huoyao; National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, CHINA
Liu, Zhengkun; National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, CHINA
Dietrich, Kay; Friedrich-Schiller-Universität Jena, Institut für Angewandte Physik, Jena, GERMANY
Kroker, Stefanie; 4.01, Metrologie für funktionale Nanosysteme, PTB-Braunschweig; Technische Universität Braunschweig, Laboratory for Emerging Nanometrology, Braunschweig, GERMANY
Kaesebier, Thomas; Friedrich-Schiller-Universität Jena, Institut für Angewandte Physik, Jena, GERMANY
Liu, Ying; National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, CHINA
Kley, Ernst-Bernhard; Friedrich-Schiller-Universität Jena, Institut für Angewandte Physik, Jena, GERMANY
Hong, Yilin; National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, CHINA
|
| Quelle/Jahr | Optics Letters: 43 (2018), 4, 811 - 814 |
| ISSN | 0146-9592 (PRINT) ; 1539-4794 (ONLINE) |
| DOI | |
| Verlag | Washington, DC: OSA |
| Klassifikationscode | OCIS: 050.1950 ; OCIS: 090.0090 ; OCIS: 120.4610 ; OCIS: 340.7480 |
| Zusammenfassung | Near-field holography (NFH) combined with electron beam lithography (EBL)-written phase masks is a promising method for the rapid realization of diffraction gratings with high resolution and high accuracy in line density distribution. We demonstrate a dynamic exposure method in which the grating substrate is shifted during pattern transfer. This reduces the effects of stitching errors, resulting in the decreased intensity of the optical stray light (i.e., Rowland ghosts). We demonstrate the intensity suppression of ghosts by 60%. This illustrates the potential for dynamic NFH to suppress undesirable periodic patterns from phase masks and alleviate the stitching errors induced by EBL. |
Zitierung
Lin, D., Chen, H., Liu, Z., Dietrich, K., Kroker, S., Kaesebier, T., Liu, Y., Kley, E.-B., & Hong, Y. (2018). Reducing Rowland ghosts in diffraction gratings by dynamic exposure near-field holography. Optics Letters, 43(4), 811–814. https://doi.org/10.1364/ol.43.000811