Zugriffsnummer 40595
Dokumenttyp Konferenzartikel
Peer Review mit Peer Review
Sprache Englisch
Titel Selective measurement of small metrology targets using CD-GISAXS
Autor(in); Institution
Pflüger, Mika; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Soltwisch, Victor; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Krumrey, Michael; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Quelle/Jahr Photomask Technology 2017: 11-14 September 2017, Monterey, California, United States:(2017), 1045110-1 - 1045110-9
Schriftenreihe Proceedings of SPIE: 10451
Herausgeber(in)
Buck, Peter D.
Gallagher, Emily E.
ISSN 0277-786X
ISBN 978-1-5106-1376-8
DOI
Verlag Bellingham, Wash.: SPIE
Konferenzangaben SPIE Photomask Technology and EUV Lithography, Monterey, CA, 11 - 14 September 2017, USA
Freie Schlagworte grazing-incidence small-angle X-ray scattering ; GISAXS ; metrology ; gratings ; spot size ; beam footprint
Zusammenfassung To address the increasing requirements of the semiconductor industry for accurate measurement of small features, Critical Dimensions (CD) Grazing-Incidence Small-Angle X-ray Scattering (GISAXS) is being considered. GISAXS oers fast, surface sensitive measurements from which relevant structural parameters can be reconstructed. However, an essential limitation for the practical application is the large measurement spot size resulting from the shallow incidence angle.1 Here we show that despite a large spot size, GISAXS measurements of small targets are possible if the targets are designed such that the scattering from the targets is separable from the scattering of other structures in the measurement spot. For grating targets, in particular rotation of the targets in the sample plane such that the grating lines are not parallel to the predominant direction of the surroundings allows reliable measurement of the target scattering irrespective of the X-ray beam size. We discuss the eect of X-ray source, rotation angle, target size and grating pitch on the minimum measurement times and number of measurable grating diraction orders and conclude that a single 50 μm
Themenbereich der Metrologie Photometrie und Radiometrie

Zitierung

Pflüger, M., Soltwisch, V., Scholze, F., & Krumrey, M. (2017). Selective measurement of small metrology targets using CD-GISAXS. SPIE Photomask Technology and EUV Lithography, Monterey, CA, 11 - 14 September 2017, USA. https://doi.org/10.1117/12.2280455

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