Temperature dependence of the leak rate of He diffusion leak artifacts

Jitschin, Wolfgang; Wandrey, Dietrich

doi:https://doi.org/10.1016/0042-207x(88)90009-7

Zugriffsnummer	40535
Dokumenttyp	Zeitschriftenartikel
Peer Review	unbekannt
Sprache	Englisch
Titel	Temperature dependence of the leak rate of He diffusion leak artifacts
Autor(in); Institution	Jitschin, Wolfgang; 9.24, Vakuumphysik, PTB-Berlin Wandrey, Dietrich; 9.24, Vakuumphysik, PTB-Berlin
Quelle/Jahr	Vacuum: 38 (1988), 7, 503 - 505
ISSN	0042-2266
DOI	https://doi.org/10.1016/0042-207x(88)90009-7
Verlag	Amsterdam: Elsevier
Zusammenfassung	Leak artifacts are widely employed as secondary standards for the calibration of leak detectors and gas flow plants. He diffusion leaks offer high long-term stability, but the leak rate varies strongly with temperature. The present paper reports on a careful investigation of the temperature dependence; the dependence can be precisely described by a simple exponential function.

Zitierung

Jitschin, W. & Wandrey, D. (1988). Temperature dependence of the leak rate of He diffusion leak artifacts. Vacuum, 38(7), 503–505. https://doi.org/10.1016/0042-207x(88)90009-7

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