| Zugriffsnummer | 40409 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | A new analysis for diffraction correction in optical interferometry |
| Autor(in); Institution |
Mana, G.; Istituto Nazionale di Ricerca Metrologica (INRIM), Torino, ITALY
Massa, E.; Istituto Nazionale di Ricerca Metrologica (INRIM), Torino, ITALY
Sasso, C. P.; Istituto Nazionale di Ricerca Metrologica (INRIM), Torino, ITALY
Andreas, Birk; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Kuetgens, Ulrich; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
|
| Quelle/Jahr | Metrologia: 54 (2017), 4, 559 - 565 |
| ISSN | 0026-1394 (PRINT) ; 1681-7575 (ONLINE) |
| DOI | |
| Verlag | Bristol: IOP Publ. |
| Freie Schlagworte | interferometers ; silicon lattice parameter ; diffraction ; angular power spectrum |
| Zusammenfassung | Dimensional measurements by laser interferometry require a correction because of diffraction, which makes the fringe period different from the wavelength of a plane wave. The fractional correction - from parts in 10-7 to parts in 10-9, depending on the beam collimation - is half the central second moment of the angular power-spectrum of the beam, a generalization of the divergence concept. We report new insights into the second moment measurement and their consequences on the measurement of the silicon lattice parameter by combined x-ray and optical interferometry. |
| Kostenfreier Zugang | Open Access Hybrid |
| Rechteinformation | CC BY 3.0 ; Creative Commons Attribution 3.0 License |