| Zugriffsnummer | 39806 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold |
| Autor(in); Institution |
Makhotkin, Igor A.; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, NB Enschede, THE NETHERLANDS
Sobierajski, Ryszard; Institute of Physics, Polish Academy of Sciences, Warsaw, POLAND
Chalubsky, Jaromir; Institute of Physics, Academy of Sciences of the Czech Republic, Prague, CZECH REPUBLIC
Tiedtke, Kai; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
de Vries, Gosse; ASML Netherlands BV, Veldhoven, THE NETHERLANDS
Störmer, Michael; Helmholtz-Zentrum Geesthacht, Geesthacht, GERMANY
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Siewert, Frank; Helmholtz Zentrum Berlin für Materialien und Energie, Berlin, GERMANY
van den Kruijs, Robert W.E.; Industrial Focus Group XUV Optics,MESA+ Institute for Nanotechnology, University of Twente, NB Enschede, THE NETHERLANDS
Milov, Igor; Industrial Focus Group XUV Optics,MESA+ Institute for Nanotechnology, University of Twente, NB Enschede, THE NETHERLANDS
Louis, Eric; Industrial Focus Group XUV Optics,MESA+ Institute for Nanotechnology, University of Twente, NB Enschede, THE NETHERLANDS
Jancyna, Iwanna; Institute of Physics, Polish Academy of Sciences, Warsaw, POLAND
Jurek, Marek; Institute of Physics, Polish Academy of Sciences, Warsaw, POLAND
Klinger, Dorota; Institute of Physics, Polish Academy of Sciences, Warsaw, POLAND
Nittler, Laurent; Institute of Physics, Polish Academy of Sciences, Warsaw, POLAND
Syryanyy, Yevgen; Institute of Physics, Polish Academy of Sciences, Warsaw, POLAND
Juha, Libor; Institute of Physics, Academy of Sciences of the Czech Republic, Prague, CZECH REPUBLIC
Hajkova, Vera; Institute of Physics, Academy of Sciences of the Czech Republic, Prague, CZECH REPUBLIC
Vozda, Vojtech; Institute of Physics, Academy of Sciences of the Czech Republic, Prague, CZECH REPUBLIC
Burian, Tomas; Institute of Physics, Academy of Sciences of the Czech Republic, Prague, CZECH REPUBLIC
Saksl, Karel; Institute of Physics, Academy of Sciences of the Czech Republic, Prague, CZECH REPUBLIC
Faatz, Bart; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
Keitel, Barbara; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
Plönjes, Elke; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
Schreiber, Siegfried; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
Toleikis, Sven; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
Loch, Rolf; Deutsches Elektronen-Synchrotron DESY, Hamburg, GERMANY
Hermann, Martin; Carl Zeiss SMT GmbH, Oberkochen, GERMANY
Strobel, Sebastian; Carl Zeiss SMT GmbH, Oberkochen, GERMANY
Nienhuys, Han-Kwang; ASML Netherlands BV, Veldhoven, THE NETHERLANDS
Gwalt, Grzegorz; Helmholtz Zentrum Berlin für Materialien und Energie, Berlin, GERMANY
Mey, Tobias; Laser-Laboratorium Göttingen eV, Göttingen, GERMANY
Enkisch, Hartmut; Carl Zeiss SMT GmbH, Oberkochen, GERMANY
|
| Quelle/Jahr | Journal of Synchrotron Radiation: 25 (2018), 77 - 84 |
| ISSN | 1600-5775 |
| DOI | |
| Verlag | Oxford: Blackwell |
| Konferenzangaben | Workshop on FEL Photon Diagnostics, Instrumentation, and Beamline Design (PhotonDiag 2017), Stanford, CA, May 1-3, 2017, USA |
| Freie Schlagworte | free-electron laser induced damage ; EUV optics ; thin films ; FELs |
| Zusammenfassung | The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20°and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface. |
| Kostenfreier Zugang | Open Access Hybrid |
| Rechteinformation | CC BY 3.0 ; Creative Commons Attribution 3.0 License |
Zitierung
Makhotkin, I. A., Sobierajski, R., Chalubsky, J., Tiedtke, K., de Vries, G., Störmer, M., Scholze, F., Siewert, F., van den Kruijs, R. W., Milov, I., Louis, E., Jancyna, I., Jurek, M., Klinger, D., Nittler, L., Syryanyy, Y., Juha, L., Hajkova, V., Vozda, V., Burian, T., Saksl, K., Faatz, B., Keitel, B., Plönjes, E., Schreiber, S., Toleikis, S., Loch, R., Hermann, M., Strobel, S., Nienhuys, H.-K., Gwalt, G., Mey, T., & Enkisch, H. (2018). Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold. Journal of Synchrotron Radiation, 25, 77–84. https://doi.org/10.1107/s1600577517017362