| Zugriffsnummer | 38798 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | Uncertainty analysis for the determination of B4C optical constants by angle-dependent reflectance measurement for 40 nm to 80 nm wavelength |
| Autor(in); Institution |
Gottwald, Alexander; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Wiese, Karl; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Kroth, Udo; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Richter, Mathias; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Applied Optics: 56 (2017), 20, 5768 - 5774 |
| ISSN | 1559-128X |
| DOI | |
| Verlag | Optical Society of America |
| Klassifikationscode | OCIS: 120.4530 ; OCIS: 120.5700 ; OCIS: 160.4670 ; OCIS: 240.0310 |
| Zusammenfassung | The index of refraction and the extinction coefficient for thin films of boron carbide were determined by angle-dependent reflectance measurements in the vacuum-ultraviolet spectral range. The numerical approximation was done using transfer-matrix formalism in combination with particle swarm optimization for the fitting algorithm. By this, not only for the reflectance measurement but also for the numerical approximation, a profound uncertainty budget was developed. This includes possible effects due to contamination and intermediate layers. Thus it was possible to establish a method for determination of n and k with reliable and highly traceable uncertainties, and to significantly improve the consistency of existing data required for current developments in optical technology. |
Zitierung
Gottwald, A., Wiese, K., Kroth, U., & Richter, M. (2017). Uncertainty analysis for the determination of B₄C optical constants by angle-dependent reflectance measurement for 40 nm to 80 nm wavelength. Applied Optics, 56(20), 5768–5774. https://doi.org/10.1364/ao.56.005768