| Zugriffsnummer | 38375 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | X-ray optics in metrological applications |
| Autor(in); Institution |
Becker, Peter; 6.13, Röntgenmetrologie, PTB-Braunschweig
Stümpel, Jürgen; 6.13, Röntgenmetrologie, PTB-Braunschweig
|
| Quelle/Jahr | Metrologia: 27 (1990), 3, 127 - 132 |
| ISSN | 0026-1394 |
| DOI | |
| Verlag | Berlin: Springer |
| Zusammenfassung | Highly pure silicon crystals with an almost perfect lattice structure constitute a powerful metrological tool. In real Si-crystals lattice spacings with an accurace better than 1 part in 107 are realized. These have been applied as length standards in the sub-nanometer region using the scanning X-ray interferometer, and as angle standards in the nanorad region with angle X-ray interferometers. Crystallographic angles between different sets of lattice planes within the same crystal differ only slghtly (1 x 10-9 rad) from values calculated for the perfect crystal. In a double-crystal arrangement Si-crystals have been used as a single-crystal polygon in order to calibrate optical angle encoders. |
