| Zugriffsnummer | 38038 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Sprache | Englisch |
| Titel | Edge detection and stability for a new e-beam pattern placement metrology instrument |
| Autor(in); Institution |
Häßler-Grohne, Wolfgang; 5.11, Maskenmesstechnik, PTB-Braunschweig
Bosse, Harald; 5.11, Maskenmesstechnik, PTB-Braunschweig
|
| Quelle/Jahr | Microelectronic Engineering: 41-42 (1998), 603 - 605 |
| ISSN | 0167-9317 |
| DOI | |
| Verlag | Amsterdam: Elsevier |
| Konferenzangaben | 23rd International Conference on Micro- and Nano-Engineering (MNE), Athens, 15-18, September, 1998, Greece |
| Zusammenfassung | For pattern placement metrology aimed at the smallest possible uncertainty, extreme care has to be taken to ensure suitable stability of all components of the used measuring instrument due to the large number of edge positions to be measured repeatedly and the associated measurement times. A new pattern placement metrology instrument operating with an e-beam probe was investigated with respect to its long-term measurement capabilities and the factors influencing the stability of the instrument. |
