Direct-reading resonant silicon cantilever for probing of surface deposits.

Zhang, Shuo; Ding, Yichao; Wu, Wenze; Bertke, Maik; Wasisto, Hutomo Suryo; Doering, Lutz; Brand, Uwe; Peiner, Erwin

doi:https://doi.org/10.1016/j.proeng.2016.11.241

Zugriffsnummer	37530
Dokumenttyp	Konferenzartikel in Zeitschrift
Peer Review	mit Peer Review
Sprache	Englisch
Titel	Direct-reading resonant silicon cantilever for probing of surface deposits.
Autor(in); Institution	Zhang, Shuo; Technische Universität Braunschweig, Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY Ding, Yichao; Technische Universität Braunschweig, Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY Wu, Wenze; Technische Universität Braunschweig, Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY Bertke, Maik; Technische Universität Braunschweig, Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY Wasisto, Hutomo Suryo; Technische Universität Braunschweig, Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY Doering, Lutz; 5.1, Oberflächenmesstechnik, PTB-Braunschweig Brand, Uwe; 5.1, Oberflächenmesstechnik, PTB-Braunschweig Peiner, Erwin; Technische Universität Braunschweig, Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Braunschweig, GERMANY
Quelle/Jahr	Procedia Engineering: 168 (2016), 658 - 661
Availability	[online only]
ISSN	1877-7058
DOI	https://doi.org/10.1016/j.proeng.2016.11.241
Verlag	Amsterdam: Elsevier
Konferenzangaben	30th Eurosensors Conference, Budapest, 04-07, September, 2016, Hungary
Freie Schlagworte	thin-film metrology ; viscoelasticity ; contact resonance method ; MEMS technology
Zusammenfassung	Contact resonance spectroscopy measurements on thin film deposits based on a tactile piezoresistive silicon microcantilever probe are described. Direct-reading capability during linescans across selectively thin-film-deposited areas of an artefact surface is demonstrated using a phase-locked-loop circuit (PLL). Good agreement found with frequency-sweep measurements followed by line-shape analysis (LSA) including non-linear damping confirm the high potential of the proposed method for nondestructive inline manufacturing-process metrology.

Kostenfreier Zugang	Open Access Gold
Rechteinformation	CC BY-NC-ND 4.0 ; Creative Commons Attribution NonCommercial NoDerivatives 4.0 License

Zitierung

Zhang, S., Ding, Y., Wu, W., Bertke, M., Wasisto, H. S., Doering, L., Brand, U., & Peiner, E. (2016). Direct-reading resonant silicon cantilever for probing of surface deposits. Procedia Engineering, 168, 658–661. https://doi.org/10.1016/j.proeng.2016.11.241

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