| Zugriffsnummer | 34682 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Impact of stochastic line edge roughness patterns on scatterometry |
| Autor(in); Institution |
Gross, Hermann; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Heidenreich, Sebastian; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
|
| Quelle/Jahr | Proceedings of XXI IMEKO World Congress:(2015), 4 S. |
| ISBN | 978-80-01-05793-3 |
| Verlag | Prague: Czech Technical University in Prague, Faculty of Electrical Engineering, Department of Measurement |
| Konferenzangaben | XXI IMEKO World Congress “Measurement in Research and Industry”, Prague, 30, August - 04, September, 2015, Czech Republic |
| Freie Schlagworte | scatterometry ; critical dimensions (CDs) ; line edge roughness (LER) ; Fourier optics |
| Zusammenfassung | We present a fast non-rigorous method for the analysis of stochastic line edge roughness (LER) with amplitudes in the range of a few nanometers, based on a 2D Fourier transform method. LER has an significant impact on the light diffraction patterns measured by scatterometry. Scatterometry is a fast, non-destructive optical method used in wafer metrology to determine the geometry parameters of periodic surface structures from scattered light intensities. |
