| Zugriffsnummer | 34489 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Sub-aperture EUV collector with dual-wavelength spectral purity filter |
| Autor(in); Institution |
Feigl, Torsten; optiX fab GmbH, Jena, GERMANY
Perske, Marco; optiX fab GmbH, Jena, GERMANY
Pauer, Hagen; optiX fab GmbH, Jena, GERMANY
Fiedler, Tobias; optiX fab GmbH, Jena, GERMANY
Zeitner, Uwe; Fraunhofer IOF, Jena, GERMANY
Leitel, Robert; Fraunhofer IOF, Jena, GERMANY
Eckstein, Hans-Christoph; Fraunhofer IOF, Jena, GERMANY
Schleicher, Philipp; Fraunhofer IOF, Jena, GERMANY
Schröder, Sven; Fraunhofer IOF, Jena, GERMANY
Trost, Marcus; Fraunhofer IOF, Jena, GERMANY
Risse, Stefan; Fraunhofer IOF, Jena, GERMANY
Steinkopf, Ralf; Fraunhofer IOF, Jena, GERMANY
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Laubis, Christian; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Extreme Ultraviolet (EUV) Lithography VI:(2015), 94220E-1 - 94220E-7 |
| Schriftenreihe | Proceedings of SPIE: 9422 |
| Herausgeber(in) |
Wood, Obert R.
Panning, Eric M.
|
| ISSN | 0277-786X |
| ISBN | 978-1-62841-531-5 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Extreme Ultraviolet (EUV) Lithography VI, San José, CA, 22-26, February, 2015, USA |
| Freie Schlagworte | EUV source ; EUV collector mirror ; multilayer mirror coatings ; spectral purity filter ; IR suppression |
| Zusammenfassung | The combination of a 10.6 µm main pulse CO2 laser and a 1064 nm pre-pulse Nd:YAG laser in EUV source concepts for HVM would require collector mirrors with an integrated spectral purity filter that suppresses both laser wavelengths. This paper discusses a new approach of a dual-wavelength spectral purity filter to suppress 10.6 µm and 1064 nm IR radiation at the same time. The dual-wavelength spectral purity filter combines two binary phase gratings that are optimized for 10.6 µm and 1064 nm, respectively. The dual phase grating structure has been realized on spherical sub-aperture EUV collector mirrors having an outer diameter of 150 mm. IR suppression factors of 260 at 10.6 µm and 620 at 1064 nm have been measured on the sub-aperture EUV collector while its EUV reflectance exceeded 64 % at 13.5 nm. |
Zitierung
Feigl, T., Perske, M., Pauer, H., Fiedler, T., Zeitner, U., Leitel, R., Eckstein, H.-C., Schleicher, P., Schröder, S., Trost, M., Risse, S., Steinkopf, R., Scholze, F., & Laubis, C. (2015). Sub-aperture EUV collector with dual-wavelength spectral purity filter. Extreme Ultraviolet (EUV) Lithography VI, San José, CA, 22-26, February, 2015, USA. https://doi.org/10.1117/12.2175666