| Zugriffsnummer | 34017 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Development and characterisation of scatterometry reference standards |
| Autor(in); Institution |
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Loechel, Bernd; Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, GERMANY
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Endres, Johannes; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Probst, Juergen; Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, GERMANY
Wurm, Matthias; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Schoengen, Max; Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, GERMANY
Krumrey, Michael; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Burger, Sven; JCMwave GmbH, Berlin, GERMANY
Soltwisch, Victor; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
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| Quelle/Jahr | Frontiers of characterization and metrology for nanoelectronics 2015:(2015), 125 - 127 |
| Herausgeber(in) |
Secula, Eric M.
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| URL | |
| Konferenzangaben | Frontiers of Characterization and Metrology for Nanoelectronics 2015, Dresden, 14-16, April, 2015, Germany |
| Freie Schlagworte | Scatterometry ; CD metrology ; traceability ; reference standards |
| Zusammenfassung | Scatterometry is widely used for dimensional metrology in nanoelectronic manufacturing. However, currently applications are limited to relative measurements for process development and process control due to the lack of traceability. To establish scatterometry as a traceable and absolute metrological method for dimensional measurements and to improve the tool matching with alternative and complementing metrology tools such as CD-SEM or CD-AFM, we have developed suitable high quality calibrated scatterometry reference standard samples. The characterisation of structure details and the grating quality have been performed based on microscopic as well as scatterometric measurements. The final characterisation and calibration of the standard samples is based on hybrid metrology approaches including different scatterometric methods in the DUV to X-ray spectral range and microscopic measurements. We have presented main specifications and design aspects of the developed standards and first measurement results obtained by DUV, EUV and X-ray scatterometry. |
Zitierung
Bodermann, B., Loechel, B., Scholze, F., Endres, J., Probst, J., Wurm, M., Schoengen, M., Krumrey, M., Burger, S., & Soltwisch, V. (2015). Development and characterisation of scatterometry reference standards. Frontiers of Characterization and Metrology for Nanoelectronics 2015, Dresden, 14-16, April, 2015, Germany.