| Zugriffsnummer | 33554 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | Calibration of transfer standards for SPM |
| Autor(in); Institution |
Gao, Feng; National Institute of Metrology of China, Beijing, CHINA
Peng, Gwo-Sheng; Industrial Research Technology Institute, Hsin Chu, TAIWAN
Koenders, Ludger; 5.12, Mikrotopographie, PTB-Braunschweig
|
| Quelle/Jahr | Microelectronic Engineering: 41/42 (1998), 615 - 618 |
| ISSN | 0167-9317 |
| DOI | |
| Verlag | Amsterdam: Elsevier |
| Zusammenfassung | A scanning probe microscope was used to investigate and to calibrate some of the today available samples on the market used for calibration of other SPMs. These samples have artificial structures between 200 nm and 10 μm fabricated by optical or electron beam lithography. A SPM was used which is equipped with capacitive sensors and carefully calibrated by using laser interferometer. |
