| Zugriffsnummer | 33552 |
| Dokumenttyp | Zeitschriftenartikel |
| Sprache | Englisch |
| Titel | Transmission scanning near-field optical microscopy with uncoated silicon tips |
| Autor(in); Institution |
Danzebrink, Hans-Ulrich; 5.12, Mikrotopographie, PTB-Braunschweig
Castiaux, Annick; Laboratoire de Physique du Solide, Facultes Universitaires Notre Dame de la Paix, Namur, BELGIUM
Girard, Christian; Laboratoire de Physique Moléculaire, Université de Franche-Comté, Besançon, FRANCE
Bouju, Xavier; Laboratoire de Physique Moléculaire, Université de Franche-Comté, Besançon, FRANCE
|
| Quelle/Jahr | Ultramicroscopy: 71 (1998), 1-4, 371 - 377 |
| ISSN | 0304-3991 |
| DOI | |
| Verlag | New York, NY: Elsevier |
| Klassifikationscode | PACS: 07.79.−v ; PACS: 07.79.Fc ; PACS: 07.79.Lh |
| Freie Schlagworte | Near-field optical microscopy (NFOM) ; Atomic-force microscopy (AFM) ; Tip-scanning instrumentation design and characterization |
| Zusammenfassung | In this paper we report on the implementation of an uncoated silicon (Si) cantilever probe into a transmission scanning near-field optical microscopy (SNOM) architecture. In a first stage, the expected transmission behaviour of a sharp silicon probe is investigated by calculating the complete electric field distribution both inside and outside a silicon tip facing a sample. Experimental applications using near-infrared radiation (λ=1.06 μm) are then proposed. In particular, compact disc features (Δx⩽1 μm) were imaged successfully with our setup (lateral resolution: better than 250 nm). Furthermore, when dealing with finer sample structures (Δx⩽100 nm), topography artifacts were clearly evidenced. The resulting highly resolved images of nanostructures are to be attributed to some interference effects occurring between the illuminated probe and the sample. |
