| Zugriffsnummer | 32248 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | The EMRP project GraphOhm - towards quantum resistance metrology based on graphene |
| Autor(in); Institution |
Ahlers, Franz Josef; 2.6, Elektrische Quantenmetrologie, PTB-Braunschweig
Kučera, J.; Cesky Metrologicky Institut (CMI), Brno, CZECH REPUBLIC
Poirier, W.; Laboratoire national de métrologie et d’essais (LNE), Paris, FRANCE
Jeanneret, B.; Federal Institute of Metrology (METAS), Bern-Wabern, SWITZERLAND
Satrapinski, A.; Mittatekniikan Keskus (MIKES), Espoo, FINLAND
Tzalenchuk, A.; NPL Management Limited, Teddington, Middlesex, UK
Vrabček, P.; Slovenský Metrologický Ústav (SMU), Bratislava 4, SLOVAKIA
Bergsten, T.; SP Sveriges Tekniska Forskningsinstitut AB (SP), Borås, SWEDEN
Hwang, C.; Korea Research Institute of Standards and Science (KRISS), KR-Daejeon, REPUBLIC OF KOREA
Yakimova, R.; Linköpings universitet, Linköping, SWEDEN
Kubatkin, S.; Chalmers tekniska högskola, Gothenburg, SWEDEN
|
| Quelle/Jahr | 29th Conference on Precision Electromagnetic Measurements digest:(2014), 548 - 549 |
| Availability | [CD-ROM] ; file name: 274.pdf |
| ISBN | 978-1-4799-2478-3 (CD) ; 978-1-4799-2479-0 |
| Verlag | Piscataway, NJ: IEEE Operations Center |
| Konferenzangaben | Conference on Precision Electromagnetic Measurements (CPEM) 2014, Rio de Janeiro, 24-29, August, 2014, Brazil |
| Freie Schlagworte | Measurement standards ; resistance ; quantum Hall effect ; graphene |
| Zusammenfassung | A new joint research project (JRP) integrating metrology institutes and universities from nine countries is aimed at realization of a new generation of standards for quantum resistance metrology. The project exploits graphene’s properties to simplify operation of standards without compromising the unprecedented precision delivered by semiconductor quantum Hall devices. Higher operating temperatures (above 4.2 K, and up to 8 K) and together with lower magnetic fields (below 5 T, and potentially down to 2 T) will lead to a significantly improved and costsaving dissemination of intrinsically referenced resistance standards to all end-users relying on electrical measurements. |
Zitierung
Ahlers, F. J., Kučera, J., Poirier, W., Jeanneret, B., Satrapinski, A., Tzalenchuk, A., Vrabček, P., Bergsten, T., Hwang, C., Yakimova, R., & Kubatkin, S. (2014). The EMRP project GraphOhm - towards quantum resistance metrology based on graphene. Conference on Precision Electromagnetic Measurements (CPEM) 2014, Rio de Janeiro, 24-29, August, 2014, Brazil.