| Zugriffsnummer | 31997 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Characteristics of a multilayer Schwarzschild objective |
| Autor(in); Institution |
Michette, Alan G.; Physics Department, King’s College London, UK
Buckley, Christopher J.; Physics Department, King’s College London, UK
Kühne, Michael; 9.1, Wärmemeßtechnik und Vakuumphysik, PTB-Berlin
Müller, Peter; 9.23, Vakuum-UV-Strahlungsmeßtechnik, PTB-Berlin
|
| Quelle/Jahr | X-ray microscopy III : proceedings of the third international conference, London, September 3 - 7, 1990:(1992), 125 - 127 |
| Schriftenreihe | Springer series in optical sciences: 67 |
| Herausgeber(in) |
Michette, Alan G.; Physics Department, King's College London, UK
Morrison, Graeme R.; Physics Department, King's College London, UK
Buckley, Christopher J.; Physics Department, King's College London, UK
|
| ISSN | 0342-4111 |
| ISBN | 978-3-662-13894-6 (print) ; 978-3-540-46887-5 (online) |
| DOI | |
| Verlag | Berlin [u.a.]: Springer |
| Konferenzangaben | X-ray microscopy III, London, September 3-7, 1990, UK |
| Freie Schlagworte | Optics ; Optoelectronics ; Plasmonics and Optical Devices |
| Zusammenfassung | The throughput of a Schwarzschild objective, coated with 50 molybdenum/silicon layer pairs for use at λ =23.2 nm, has been measured. The peak reflectivity of 3±1% and bandpass of 10% are similar to those expected. |
