| Zugriffsnummer | 31411 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Nanometrology on gratings with GISAXS: FEM reconstruction and Fourier analysis |
| Autor(in); Institution |
Soltwisch, Victor; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Wernecke, Jan; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Haase, Anton; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Probst, Jürgen; Helmholtz-Zentrum Berlin (HZB), Berlin, GERMANY
Schoengen, Max; Helmholtz-Zentrum Berlin (HZB), Berlin, GERMANY
Krumrey, Michael; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Metrology, Inspection, and Process Control for Microlithography XXVIII: 9050 (2014), 905012-1 - 905012-12 |
| Schriftenreihe | Proceedings of SPIE: 9050 |
| Availability | [CD-ROM] ; file name: 9050_36.pdf |
| Herausgeber(in) |
Cain, Jason P.
Sanchez, Martha I.
|
| ISSN | 0277-786X |
| ISBN | 978-0-8194-9973-8 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | Metrology, Inspection, and Process Control for Microlithography XXVIII, San Jose, CA, 23-27 February, 2014, USA |
| Freie Schlagworte | optical metrology ; computational lithography ; finite element method ; grazing incidence scatterometry ; electron beam lithography ; Fourier transformation |
| Zusammenfassung | The aim of the semiconductor industry to decrease the feature size of integrated circuits poses a huge technological endeavor. Consequently, new challenges are arising for metrology on structures in the nanometer regime. Scatterometry is a fast method which provides non-contact non-destructive characterization of structures on photomasks or exposed wafers. However, the determination of important line structure parameters with subnanometer accuracy still needs further investigation. Grazing incidence small-angle X-ray scattering (GISAXS) is a scatterometry technique to measure both vertical and lateral structural features in the nanometer range with high sensitivity. We apply GISAXS to the investigation of structural parameters such as period length, sidewall angle, linewidth and height on silicon gratings. Our test structures with nominal widths of 35 nm to 100 nm and a pitch from 100 .mycro.m to 250 nm were fabricated by electron beam lithography. The diffraction patterns have been analyzed by power spectral density analysis which directly yields periodical modulations of the structured surface such as line width or groove width. We also apply a finite element method (FEM) to the diffraction peak intensity of the grating structure obtained with GISAXS for the geometric reconstruction of the line shape. |
Zitierung
Soltwisch, V., Wernecke, J., Haase, A., Probst, J., Schoengen, M., Krumrey, M., & Scholze, F. (2014). Nanometrology on gratings with GISAXS: FEM reconstruction and Fourier analysis. Metrology, Inspection, and Process Control for Microlithography XXVIII, San Jose, CA, 23-27 February, 2014, USA. https://doi.org/10.1117/12.2046212