Zugriffsnummer 30672
Dokumenttyp Buchartikel
Sprache Englisch
Titel Advanced silicon radiation detectors in the vacuum ultraviolet (VUV) and the extreme ultraviolet (EUV) spectral range
Autor(in); Institution
Gottwald, Alexander; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Scholze, Frank; 7.1, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Quelle/Jahr Smart sensors and MEMS Intelligent devices and microsystems for industrial applications:(2014), 102 - 123
Herausgeber(in)
Nihtianov, Stoyan; Delft University of Technology, Delft, THE NETHERLANDS
Luque, Antonio; University of Seville, Sevill, SPAIN
ISBN 978-0-85709-502-2
DOI
Verlag Cambridge, UK: Woodhad Publishing Limited
Freie Schlagworte VUV/EUV radiation ; silicon photodetectors ; spectral responsivity ; radiation hardness ; VUV/EUV radiation damage
Zusammenfassung In this chapter, the numerous challenges in reliablemeasurement of vacuum ultraviolet (VUV) and extreme ultraviolet (EUV) radiation with silicon radiation detectors will be discussed. The most severe issue is the high absorbance of any kind of material in these spectral ranges, which poses stringent requirements on possible detector designs. In particular, a high value of the spectral responsivity and the necessary radiation hardness put contradicting demands on the devices. In order to fi nd a solution, it is necessary to describe and understand in detail the basic physical processes for the interaction between the radiation and the detector. The spectral responsivity of VUV and EUV detectors is measured using monochromatized synchrotron radiation as a radiation source, and electrical substitution radiometers as primary detector standards. We will present selected types of silicon-based semiconductor detectors, and discuss their performance in the context of the named aspects.

Zitierung

Gottwald, A. & Scholze, F. (2014). Advanced silicon radiation detectors in the vacuum ultraviolet (VUV) and the extreme ultraviolet (EUV) spectral range. In S. Nihtianov & A. Luque (Eds.), Smart sensors and MEMS Intelligent devices and microsystems for industrial applications (pp. 102–123). Cambridge, UK: Woodhad Publishing Limited. https://doi.org/10.1533/9780857099297.1.102

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