Zugriffsnummer 29356
Dokumenttyp Konferenzartikel
Peer Review unbekannt
Sprache Englisch
Titel The effect of line roughness on DUV scatterometry
Autor(in); Institution
Henn, Mark-Alexander; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Heidenreich, Sebastian; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Gross, Hermann; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bär, Markus; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Quelle/Jahr Modeling Aspects in Optical Metrology IV:(2013), 1 - 6
Artikelnummer 87890U
Schriftenreihe Proceedings of SPIE: 8789
Availability [CD-ROM] ; file name: 8789_30.pdf
Herausgeber(in)
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
ISBN 978-0-8194-9605-8
DOI
Verlag Bellingham, Wash.: SPIE
Konferenzangaben SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology IV, Munich, 13-14, May, 2013, Germany
Freie Schlagworte Scatterometry ; Optical metrology ; Line edge roughness
Zusammenfassung The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.

Zitierung

Henn, M.-A., Heidenreich, S., Gross, H., Bodermann, B., & Bär, M. (2013). The effect of line roughness on DUV scatterometry. SPIE Conference Optical Metrology: Modeling Aspects in Optical Metrology IV, Munich, 13-14, May, 2013, Germany. https://doi.org/10.1117/12.2020761

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