| Zugriffsnummer | 28786 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Fast simulation method for parameter reconstruction in optical metrology |
| Autor(in); Institution |
Burger, Sven; Zuse Institute Berlin (ZIB), Berlin, GERMANY; JCMwave GmbH, Berlin, GERMANY
Zschiedrich, Lin; JCMwave GmbH, Berlin, GERMANY
Pomplun, Jan; JCMwave GmbH, Berlin, GERMANY
Schmidt, Frank; Zuse Institute Berlin (ZIB), Berlin, GERMANY; JCMwave GmbH, Berlin, GERMANY
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
|
| Quelle/Jahr | Metrology, inspection, and process control for microlithography XXVII:(2013), 868119-1 - 868119-7 |
| Schriftenreihe | Proceedings of SPIE: 8681,1 |
| Herausgeber(in) |
Starikov, Alexander
|
| ISBN | 978-081-949-463-4 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, Calif., 24-28, February, 2013, USA |
| Freie Schlagworte | Scatterometry ; optical metrology ; 3D rigorous electromagnetic field simulations ; computational lithography ; finite-element methods |
| Zusammenfassung | A method for automatic computation of parameter derivatives of numerically computed light scattering signals is demonstrated. The finite-element based method is validated in a numerical convergence study, and it is applied to investigate the sensitivity of a scatterometric setup with respect to geometrical parameters of the scattering target. The method can significantly improve numerical performance of design optimization, parameter reconstruction, sensitivity analysis, and other applications. |
Zitierung
Burger, S., Zschiedrich, L., Pomplun, J., Schmidt, F., & Bodermann, B. (2013). Fast simulation method for parameter reconstruction in optical metrology. SPIE Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, Calif., 24-28, February, 2013, USA. https://doi.org/10.1117/12.2011154