| Zugriffsnummer | 28525 |
| Dokumenttyp | Zeitschriftenartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Chemical interactions in the layered system BCxNy/Ni(Cu)/Si, produced by CVD at high temperature |
| Autor(in); Institution |
Hoffmann, P. S.; Department of Materials Science, Technische Universität Darmstadt, Darmstadt, GERMANY
Kosinova, M. I.; Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk, RUSSIA
Flege, S.; Department of Materials Science, Technische Universität Darmstadt, Darmstadt, GERMANY
Baake, O.; Department of Materials Science, Technische Universität Darmstadt, Darmstadt, GERMANY
Pollakowski, Beatrix; 7.2, Kryophysik und Spektrometrie, PTB-Berlin
Trunova, V. A.; Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk, RUSSIA
Klein, A.; Department of Materials Science, Technische Universität Darmstadt, Darmstadt, GERMANY
Beckhoff, Burkhard; 7.2, Kryophysik und Spektrometrie, PTB-Berlin
Kuznetsov, F. A.; Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk, RUSSIA
Ensinger, W.; Department of Materials Science, Technische Universität Darmstadt, Darmstadt, GERMANY
|
| Quelle/Jahr | Analytical and Bioanalytical Chemistry: 404 (2012), 2, 479 - 487 |
| ISSN | 1618-2642 (PRINT) ; 1618-2650 (ONLINE) |
| DOI | |
| Verlag | Berlin: Springer |
| Freie Schlagworte | Boron carbonitride/metal/silicon-layered system ; Interfaces ; Near-edge X-ray absorption fine-structure ; X-ray photoelectron spectroscopy ; Secondary ion mass spectroscopy Introduction |
| Zusammenfassung | Layered samples Si(100)/C/Ni/BCxNy and Si (100)/C/Cu/BCxNy were produced by physical vapor deposition of a metal (Ni, Cu, resp.) and low-pressure chemical vapor deposition of the boron carbonitride on a Si(100) substrate. Between the Si and the Ni (Cu) and on the surface of the Ni (Cu) layer, thin carbon layers were deposited, as a diffusion barrier or as a protection against oxidation, respectively. Afterwards, the surface carbon layer was removed. As precursor, trimethylamine borane and, as an auxiliary gas, H2 and NH3 were used, respectively. The chemical compositions of the layers and of the interfaces in between were characterized by total-reflection X-ray fluorescence spectrometry combined with near-edge X-ray absorption fine-structure spectroscopy, X-ray photoelectron spectroscopy, and secondary ion mass spectrometry. The application of H2 yielded the BCxNy compound whereas the use of NH3 led to a mixture of h-BN and graphitic carbon. At the BCxNy/metal interface, metal borides could be identified. At the relatively high synthesis temperature of 700 °C, broad regions of Cu or Ni and Si were observed between the metal layer and the substrate Si. |
Zitierung
Hoffmann, P. S., Kosinova, M. I., Flege, S., Baake, O., Pollakowski, B., Trunova, V. A., Klein, A., Beckhoff, B., Kuznetsov, F. A., & Ensinger, W. (2012). Chemical interactions in the layered system BCxNy/Ni(Cu)/Si, produced by CVD at high temperature. Analytical and Bioanalytical Chemistry, 404(2), 479–487. https://doi.org/10.1007/s00216-012-6177-2