| Zugriffsnummer | 26611 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Sprache | Englisch |
| Titel | Deep ultraviolet scatterometer for dimensional characterization of nanostructures: system improvements and test measurements |
| Autor(in); Institution |
Wurm, Matthias; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bonifer, Stefanie; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Richter, Jan; Advanced Mask Technology Center, Dresden, GERMANY
|
| Quelle/Jahr | Measurement Science and Technology: 22 (2011), 9, 094024-1 - 094024-9 |
| ISSN | 0957-0233 (PRINT) |
| DOI | |
| URL | |
| Verlag | Bristol: IOP Publ. |
| Konferenzangaben | 5th Seminar on Nanoscale Calibration Standards and Methods and the 9th Seminar on Quantitative Microscopy, Brno, 27-29, October, 2010, Czech Republic |
| Freie Schlagworte | scatterometry ; edge ; pitch ; critical dimensions ; diffractometry ; reflectometry ; profile ; 193 nm ; at-wavelength metrology ; inverse diffraction problem ; polarization |
| Zusammenfassung | A novel type of deep ultraviolet scatterometer recently developed and set up at PTB has been significantly improved with respect to the dynamic range and the signal-to-noise ratio of the measured scatterograms. The main modifications concern a novel digital data acquisition technique and a new method for the calibration of the applied detectors. With the improved system linewidths (critical dimensions), measurements on periodic structures on a state-of-the-art MoSi photomask have been carried out. The results are compared to those achieved with a scanning electron microscope and a spectroscopic scatterometer. |
Zitierung
Wurm, M., Bonifer, S., Bodermann, B., & Richter, J. (2011). Deep ultraviolet scatterometer for dimensional characterization of nanostructures: system improvements and test measurements. Measurement Science and Technology, 22(9), 094024-1–094024-9. https://doi.org/10.1088/0957-0233/22/9/094024