| Zugriffsnummer | 26414 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Peer Review | mit Peer Review |
| Sprache | Englisch |
| Titel | Benefits of on-wafer calibration standards fabricated in membrane technology |
| Autor(in); Institution |
Rohland, Martina; 2.2, Hochfrequenz und Felder, PTB-Braunschweig; TU Braunschweig, Institut für Mikrotechnik, Braunschweig, GERMANY
Arz, Uwe; 2.2, Hochfrequenz und Felder, PTB-Braunschweig
Büttgenbach, Stephanus; TU Braunschweig, Institut für Mikrotechnik, Braunschweig, GERMANY
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| Quelle/Jahr | Kleinheubacher Berichte 2010. Advances in Radio Science: 9 (2011), 19 - 26 |
| Availability | [online only] |
| ISSN | 1684-9973 |
| DOI | |
| URL | |
| Verlag | Göttingen: Copernicus Publications |
| Konferenzangaben | Kleinheubacher Tagung 2010, Miltenberg, 04-06, Oktober, 2010, Deutschland |
| Zusammenfassung | In this work we compare on-wafer calibration standards fabricated in membrane technology with standards built in conventional thin- film technology. We perform this comparison by investigating the propagation of uncertainties in the geometry and material properties to the broadband electrical properties of the standards. For coplanar waveguides used as line standards the analysis based on Monte Carlo simulations demonstrates an up to tenfold reduction in uncertainty depending on the electromagnetic waveguide property we look at. |
| Kostenfreier Zugang | Open Access Gold |
| Rechteinformation | CC BY 3.0 ; Creative Commons Attribution 3.0 License |