| Zugriffsnummer | 26401 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Extending ellipsometry into the EUV spectral range [poster] |
| Autor(in); Institution |
Laubis, Christian; 7.2, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Kato, Akiko; 7.2, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
Scholze, Frank; 7.2, Radiometrie mit Synchrotronstrahlung, PTB-Berlin
|
| Quelle/Jahr | Conference CD : talks and posters // 6th Workshop Ellipsometry:(2011), 1 S. |
| Availability | [CD-ROM] ; file name: 6th Workshop Ellipsometry - P36 - Frank Scholze.pdf |
| Herausgeber(in) |
Furchner, A.; ISAS, Berlin, GERMANY
|
| ISBN | 978-3-00-034934-8 |
| Verlag | Berlin: ISAS |
| Konferenzangaben | 6th Workshop Ellipsometry, Berlin, February 21-24, 2011, Germany |
| Zusammenfassung | Very thin coatings in the thickness range of 1 nm and below are of growing importance for either optical application in the short wavelength range (EUV, water window) or as functional layers, diffusion barriers etc. in e.g. semiconductor applications, especially for multilayer mirrors used for extreme ultraviolet (EUV) lithography. These thin layers are difficult to measure by optical wavelength ellipsometry. Thus, extending ellipsometry to smaller wavelengths is to obvious step. PTB started investigations into EUV ellipsometry at its synchrotron radiation laboratory to support this development by advanced characterization methods. As a prerequisite, the polarization properties of the PTB soft x-ray beamline used for EUV work were determined. Reflectometry in the EUV and soft X-ray spectral range was used to derive film thickness and layer stack composition for thin coatings. Often, the optical properties of the relevant materials are not sufficiently well known. Therefore, PTB designed new versatile reflectometer / scatterometer to be installed at the EUV radiometry beamline. The instrument shall facilitate polarization resolved measurement of specular and off-specular reflectance using linearly polarized incident radiation. An option for the analysis of the polarization of the reflected light is planned. We show measurements where polarization, angle of incidence, or wavelength are varied. |
