| Zugriffsnummer | 25641 |
| Dokumenttyp | Buchartikel |
| Sprache | Englisch |
| Titel | Scanning Probe Microscopy, Scanning Electron Microscopy and critical dimension: nanometrology status and future needs within Europe |
| Autor(in); Institution |
Danzebrink, Hans-Ulrich; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Dziomba, Thorsten; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Xu, Min; 5.1, Oberflächenmesstechnik, PTB-Braunschweig
Pidduck, Allan; QinetiQ Ltd., Malvern, UK
Leach, Richard; National Physical Laboratory (NPL), Teddington, UK
Yacoot, Andrew; National Physical Laboratory (NPL), Teddington, UK
Koenders, Ludger; 5.1, Oberflächenmesstechnik, PTB-Braunschweig
|
| Quelle/Jahr | Nanometrology discussion papers:(2010), 72 - 95 |
| Availability | [online] |
| Herausgeber(in) |
Burke, Theresa
|
| ISBN | 978-0-9566809-0-7 |
| Verlag | Cranfield: Co-nanomet Consortium |
| Freie Schlagworte | nano metrology ; Scanning Force Microscopy (SFM) ; scanning probe microscopy (SPM) ; atomic force microscopy (AFM) ; Scanning Electron Microscopy (SEM) ; critical dimensions |
| Zusammenfassung | Metrology is necessary as the key discipline to enable the exchange of industrial products or components. To achieve this, metrology at National Metrology Institutes (NMIs) is concerned with measurements at the highest level of accuracy and smallest uncertainty. Advances in metrology depend on many factors: improvements in scientific and technical knowledge, instrumentation quality, and, since metrology has a high impact on the overall quality of industrial products, they depend also on the clear knowledge of the present and future demands from industry. |
Zitierung
Danzebrink, H.-U., Dziomba, T., Xu, M., Pidduck, A., Leach, R., Yacoot, A., & Koenders, L. (2010). Scanning Probe Microscopy, Scanning Electron Microscopy and critical dimension: nanometrology status and future needs within Europe. In T. Burke (Ed.), Nanometrology discussion papers (pp. 72–95). Cranfield: Co-nanomet Consortium.