| Zugriffsnummer | 24196 |
| Dokumenttyp | Konferenzartikel |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Results of an international photomask linewidth comparison of NIST and PTB |
| Autor(in); Institution |
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bergmann, Detlef; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Buhr, Egbert; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Häßler-Grohne, Wolfgang; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bosse, Harald; 5, Fertigungsmesstechnik, PTB-Braunschweig
Potzick, James; National Institute of Standards and Technology, Gaithersburg, MD, USA
Dixon, Ron; National Institute of Standards and Technology, Gaithersburg, MD, USA
Quintanilha, Richard; National Institute of Standards and Technology, Gaithersburg, MD, USA
Stocker, Michael; National Institute of Standards and Technology, Gaithersburg, MD, USA
Vladar, Andras; National Institute of Standards and Technology, Gaithersburg, MD, USA
Orji, N. George; National Institute of Standards and Technology, Gaithersburg, MD, USA
|
| Quelle/Jahr | Photomask Technology 2009:(2009), 1 - 14 |
| Artikelnummer | 74881H |
| Schriftenreihe | Proceedings of SPIE on CD-ROM: 7488 |
| Availability | [CD-ROM] ; file name: 7488-51.pdf |
| Herausgeber(in) |
Zurbrick, Larry S.
|
| ISBN | 978-0-8194-7796-5 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | SPIE Conference on Photomask Technology 2009, Monterey, 14-18, September, 2009, USA |
| Freie Schlagworte | linewidth ; CD metrology ; uncertainty components ; Nano1 ; international comparison ; MRA ; photomask ; at-wavelength metrology |
| Zusammenfassung | In preparation for the international Nano1 linewidth comparison on photomasks between nine national metrology institutes, the National Institute of Standards and Technology (NIST) and the Physikalisch-Technische Bundesanstalt (PTB), initiated a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This paper reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison. |
Zitierung
Bodermann, B., Bergmann, D., Buhr, E., Häßler-Grohne, W., Bosse, H., Potzick, J., Dixon, R., Quintanilha, R., Stocker, M., Vladar, A., & Orji, N. G. (2009). Results of an international photomask linewidth comparison of NIST and PTB. SPIE Conference on Photomask Technology 2009, Monterey, 14-18, September, 2009, USA. https://doi.org/10.1117/12.831373