| Zugriffsnummer | 22876 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Peer Review | unbekannt |
| Sprache | Englisch |
| Titel | Complementary metrology within a European joint laboratory |
| Autor(in); Institution |
Nutsch, A.; Fraunhofer IISB, Erlangen, GERMANY
Beckhoff, Burkhard; 7.1, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Altmann, R.; Fraunhofer IISB, Erlangen, GERMANY
Berg, J.A. Van Den; University of Salford, Institute for Materials Research, Salford, UK
Giubertoni, D.; Fondazione Bruno Kessler, Povo, ITALY
Hönicke, Philipp; 7.1, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Bersani, M.; Fondazione Bruno Kessler, Povo, ITALY
Leibold, A.; Fraunhofer IISB, Erlangen, GERMANY
Meirer, F.; Atominstitut, Vienna University of Technology, Wien, AUSTRIA
Mueller, Matthias; 7.1, Röntgenmesstechnik mit Synchrotronstrahlung, PTB-Berlin
Pepponi, G.; Fondazione Bruno Kessler, Povo, ITALY
Otto, M.; Fraunhofer IISB, Erlangen, GERMANY
Petrik, P.; MTA-MFA, Budapest, HUNGARY
Reading, M.; University of Salford, Institute for Materials Research, Salford, UK
Pfitzner, L.; Fraunhofer IISB, Erlangen, GERMANY
Ryssel, H.; Fraunhofer IISB, Erlangen, GERMANY
|
| Quelle/Jahr | UCPSS 2008: Proceedings of the Ninth International Symposium on Ultra-Clean Processing of Semiconductor Surfaces. Solid State Phenomena: 145/146 (2009), 97 - 100 |
| ISSN | 1662-9779 |
| ISBN | 3-908451-64-7 ; 978-3-908451-64-8 |
| DOI | |
| Verlag | Zürich: Trans Tech Publ. |
| Konferenzangaben | International Symposium on Ultra Clean Processing of Semiconductor Surfaces IX, Brugge, 22-24, September, 2008, Belgium |
| Freie Schlagworte | ultra trace analysis ; ultra shallow junctions ; thin layers ; research infrastructures |
| Zusammenfassung | The continuous dimensional reduction drives the development of metrology, analysis and characterization for nano and micro electronics. An enormous worldwide R&D effort focuses on the understanding and controlling materials properties and dimensions at atomic level. Crucial for groundbreaking new developments is the availability of appropriate analytical infrastructures providing techniques with information depths well adapted to the nanoscaled objects of interest. This requires widely accessible, independent complementary metrology, analytical techniques, and characterization. For example new materials and the demand of improved detection sensitivities for contaminants provide huge challenges for the capabilities of current analysis equipment and expertise. At the same time, the availability of complementary competences is crucial for advancement of analytical methodologies through cross-comparison, round-robin, and benchmarking of results. This paper describes the formation of an independent analytical infrastructure within Europe having the expertise and competence to solve metrology problems for development of nanotechnologies. Furthermore, a strategy is shown to establish independently operating ‘Golden Laboratories’ for complementary and reliable metrology, analysis, and characterization adapted to the requirements of industrial partners. |
Zitierung
Nutsch, A., Beckhoff, B., Altmann, R., Berg, J. V. D., Giubertoni, D., Hönicke, P., Bersani, M., Leibold, A., Meirer, F., Mueller, M., Pepponi, G., Otto, M., Petrik, P., Reading, M., Pfitzner, L., & Ryssel, H. (2009). Complementary metrology within a European joint laboratory. Solid State Phenomena, 145/146, 97–100. https://doi.org/10.4028/www.scientific.net/ssp.145-146.97