| Zugriffsnummer | 22862 |
| Dokumenttyp | Konferenzartikel in Zeitschrift |
| Peer Review | ohne Peer Review |
| Sprache | Englisch |
| Titel | Sensitivity analysis for indirect measurement and profile reconstruction in scatterometry |
| Autor(in); Institution |
Groß, Hermann; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Rathsfeld, Andreas; Weierstrass Institute for Applied Analysis and Stochastics, Berlin, GERMANY
|
| Quelle/Jahr | Proceedings in Applied Mathematics and Mechanics: 7 (2007), 1, 1130503 - 1130504 |
| Availability | [online only] |
| ISSN | 1617-7061 |
| DOI | |
| Verlag | Weinheim [u.a.]: Wiley-VCH |
| Konferenzangaben | Sixth International Congress on Industrial Applied Mathematics (ICIAM07) and GAMM Annual Meeting, Zürich 2007, Zürich, 16-20, July, 2007, Switzerland |
| Freie Schlagworte | Scatterometry ; Inverse problems ; Sensitivity analysis |
| Zusammenfassung | To control the design and manufacturing of lithographic masks a fast and non-destructive measurement technique is needed. In scatterometry the mask is illuminated by plane waves from various directions, the scattered light is measured, and the geometry of the mask surface is reconstructed from the measured data. The quality of reconstruction surely depends on the angles of incidence, on the wave lengths and/or the number of propagating scattered wave modes. Optimizing the conditioning of some Jacobian matrices, we develop a sensitivity analysis to find an optimal measurement configuration for scatterometry. Our first important test geometry is a simple periodic line-space structure. |
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