Zugriffsnummer 22786
Dokumenttyp Konferenzartikel in Zeitschrift Open Access Gold
Peer Review mit Peer Review
Sprache Englisch
Titel A scatterometry inverse problem in optical mask technology
Autor(in); Institution
Model, Regine; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Rathsfeld, Andreas; Weierstraß-Institut für Angewandte Analysis und Stochastik, Berlin, GERMANY
Groß, Hermann; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Wurm, Matthias; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bodermann, Bernd; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Quelle/Jahr Journal of Physics: Conference Series: 135 (2008), 8 S.
Artikelnummer 012071
ISSN 1742-6588 (PRINT) ; 1742-6596 (ONLINE)
DOI
Verlag Bristol: IOP Publ.
Konferenzangaben 6th International Conference on Inverse Problems in Engineering: Theory and Practice, Dourdan, 15-19, June, 2008, France
Freie Schlagworte scatterometry ; inverse problem
Zusammenfassung We discuss the solution of the inverse problem in scatterometry i.e. the determination of periodic surface structures from light diffraction patterns. With decreasing details of lithography masks, increasing demands on metrology techniques arise. By scatterometry as a non-imaging indirect optical method critical dimensions (CD) like side-wall angles, heights, top and bottom widths are determined. The numerical simulation of diffraction is based on the finite element solution of the Helmholtz equation. The inverse problem seeks to reconstruct the grating geometry from measured diffraction patterns. The inverse operator maps efficiencies of diffracted plane wave modes to the grating parameters. We employ a Newton type iterative method to solve the resulting minimum problem. The reconstruction quality surely depends on the angles of incidence, on the wave lengths and/or the number of propagating scattered wave modes and will be discussed by numerical examples.
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Zitierung

Model, R., Rathsfeld, A., Groß, H., Wurm, M., & Bodermann, B. (2008). A scatterometry inverse problem in optical mask technology. Journal of Physics: Conference Series, 135, 8 S. https://doi.org/10.1088/1742-6596/135/1/012071

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