Zugriffsnummer 22679
Dokumenttyp Konferenzartikel
Peer Review unbekannt
Sprache Englisch
Titel FEM study of monolithic silicon translation mechanisms for a 10 μm scanning x-ray interferometer
Autor(in); Institution
Kuetgens, Ulrich; 6.13, Röntgenmetrologie, PTB-Braunschweig
Becker, Peter; 6.13, Röntgenmetrologie, PTB-Braunschweig
Bertolotto Bianc, G.; Universita di Torino, Istituto di Fisica Generale, Torino, ITALY
Jäger, Valentin; 5.31, Zentraler Gerätebau - Fertigung, PTB-Braunschweig
Stümpel, Jürgen; 6.13, Röntgenmetrologie, PTB-Braunschweig
Zosi, G.; Universita di Torino, Istituto di Fisica Generale, Torino, ITALY
Quelle/Jahr Ultraprecision in manufacturing engineering : proceedings of the 3rd International Conference on Ultraprecision in Manufacturing Engineering, May 1994, Aachen, Germany:(1994), 118 - 121
Herausgeber(in)
Weck, Manfred
Kunzmann, Horst; 5, Fertigungsmesstechnik, PTB-Braunschweig
ISBN 3-926832-11-8
Verlag Duisburg: Rhiem
Konferenzangaben 3rd International Conference on Ultraprecision in Manufacturing Engineering, Aachen, May, 1994, Germany

Zitierung

Kuetgens, U., Becker, P., Bertolotto Bianc, G., Jäger, V., Stümpel, J., & Zosi, G. (1994). FEM study of monolithic silicon translation mechanisms for a 10 μm scanning x-ray interferometer. 3rd International Conference on Ultraprecision in Manufacturing Engineering, Aachen, May, 1994, Germany.

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