| Zugriffsnummer | 22498 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Interferometry at the PTB nanometer comparator - design, status and development |
| Autor(in); Institution |
Flügge, Jens; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Weichert, Ch.; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Hwu, EnTe; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Köning, Rainer; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Bosse, Harald; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Wiegmann, Axel; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Schulz, Michael; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Elster, Clemens; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Geckeler, Ralf D.; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
|
| Quelle/Jahr | Fifth International Symposium on Instrumentation Science and Technology:(2009), 713346-1 - 713346-8 |
| Schriftenreihe | Proceedings of SPIE: 7133,2 |
| Herausgeber(in) |
Tan, Jiubin
|
| ISBN | 978-0-8194-7367-7 |
| DOI | |
| Verlag | Bellingham, Wash.: SPIE |
| Konferenzangaben | ISIST 2008, 5th International Symposium on Instrumentation Science and Technology, Shenyang (Mukden), 15-18, September, 2008, China |
| Freie Schlagworte | Interferometer ; Length Encoder ; Registration ; vacuum interferometry ; length metrology |
| Zusammenfassung | To minimize the measurement uncertainty of one dimensional length measurements on line scales, linear encoders and interferometers the PTB in cooperation with the Dr. Johannes Heidenhain GmbH had built up a new length comparator. The Nanometer Comparator has already proven its performance during the measurements of incremental encoders and line scales with an expanded measurement uncertainty of below 5 nm. Due to the introduction of double and multiple exposure in advanced lithography techniques the overlay and registration metrology requirements will drastically increase so that reference metrology tools need to be developed further to be able to follow the resulting decrease of the specifications. Therefore, the PTB further develops the new 1D vacuum comparator to add a measurement possibility for straightness and to reach a measurement accuracy in the sub nanometer range. One key development will be the interferometric measurement of all six degrees of freedom of the measurement slide of the comparator. A new multi axis heterodyne interferometer electronics and optical interferometer designs minimizing nonlinearities by spatially separated beams are under development. |
Zitierung
Flügge, J., Weichert, C., Hwu, E., Köning, R., Bosse, H., Wiegmann, A., Schulz, M., Elster, C., & Geckeler, R. D. (2009). Interferometry at the PTB nanometer comparator - design, status and development. ISIST 2008, 5th International Symposium on Instrumentation Science and Technology, Shenyang (Mukden), 15-18, September, 2008, China. https://doi.org/10.1117/12.821252