| Zugriffsnummer | 21775 |
| Dokumenttyp | Konferenzartikel |
| Sprache | Englisch |
| Titel | Further development of the nanometer comparator for straightness measurements at the nanometer level |
| Autor(in); Institution |
Flügge, Jens; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Köning, Rainer; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Wiegmann, Axel; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Weichert, Christoph; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Schulz, Michael; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Elster, Clemens; 8.4, Mathematische Modellierung und Datenanalyse, PTB-Berlin
Häßler-Grohne, Wolfgang; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Bosse, Harald; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
Geckeler, Ralf D.; 5.2, Dimensionelle Nanometrologie, PTB-Braunschweig
|
| Quelle/Jahr | Proceedings of the 10th anniversary international conference of the European Society for Precision Engineering and Nanotechnology: 1 (2008), 486 - 489 |
| Herausgeber(in) |
Brussel, Hendrik van
|
| ISBN | 978-0-9553082-5-3 |
| Verlag | Bedford: Euspen |
| Konferenzangaben | 10th anniversary international conference of the european society for precision engineering and nanotechnology, Zürich, 18-22, May, 2008, Switzerland |
| Freie Schlagworte | interferometry ; straightness measurement ; encoder |
| Zusammenfassung | The Nanometer Comparator is the PTB reference length comparator for line scales and encoder systems. The basis component of the comparator is the vacuum laser interferometer, which allows to achieve smallest measurement uncertainties for position measurements on line structures and gratings. The calibration capability of the comparator, e.g. given by CMC entries is 1.2 nm for encoders and 9.1 nm for line scales of 280 mm as an example. However, this applies only to one measurement axis. For high precision characterizations of scales with graduations as well as incremental encoders the measurement of the straightness of graduation lines becomes increasingly important. By application of new encoder systems with an additional short range y-axis measurement capability the accuracy of stacked 2D positioning systems can be improved without using laser interferometers. Also the demands on the 2D position measurement accuracy of structures on photo masks used for emerging lithography techniques like e.g. double patterning are rapidly increasing. Because of these requirements on high precision position and straightness metrology the Nanometer Comparator at the PTB will be equipped with a second short range measurement y-axis for measurement objects up to 550 mm in length or 310 mm in width. Additionally the Nanometer Comparator should be further optimized to reduce the measurement uncertainty for length measurements down to the sub-nanometer range. |
Zitierung
Flügge, J., Köning, R., Wiegmann, A., Weichert, C., Schulz, M., Elster, C., Häßler-Grohne, W., Bosse, H., & Geckeler, R. D. (2008). Further development of the nanometer comparator for straightness measurements at the nanometer level. 10th anniversary international conference of the european society for precision engineering and nanotechnology, Zürich, 18-22, May, 2008, Switzerland.