Zugriffsnummer 20183
Dokumenttyp Konferenzartikel
Peer Review unbekannt
Sprache Englisch
Titel A new SEM CD operator verified against Monte Carlo simulations
Autor(in); Institution
Frase, Carl Georg; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
Gnieser, Dominic; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
Dirscherl, Kai; Danish Fundamental Metrology Ltd., Lyngby, DENMARK
Buhr, Egbert; 4.2, Bild- und Wellenoptik, PTB-Braunschweig
Bosse, Harald; 5.2, Längen- und Winkelteilungen, PTB-Braunschweig
Quelle/Jahr Metrology, inspection, and process control for microlithography XXI:(2007), 65184P-1 - 65184P-12
Schriftenreihe Proceedings of SPIE: 6518
Herausgeber(in)
Archie, Chas N.
ISBN 978-0-8194-6637-2
DOI
Verlag Bellingham, Wash.: SPIE
Konferenzangaben Advanced Lithography 2007, San Jose, Calif., 26, February - 02, March, 2007, USA
Freie Schlagworte Scanning Electron Microscopy ; CD-SEM ; Monte Carlo ; CD Operator ; Edge Detection
Zusammenfassung A new algorithm for SEM CD evaluation of trapezoidal line structures is presented. It is based on the physical modeling of SEM image formation and allows the assignment of top and bottom structural edge positions to the SEM signal. The SEM image profile is described by a set of piecewise continuous functions which is convoluted with the electron probe intensity profile. The resulting function is fitted to the measured signal profile by a least squares algorithm. The fit returns both top and bottom edge positions as well as the electron probe diameter. The algorithm is verified against three different Monte Carlo simulation programs using different physical models of elastic and inelastic electron scattering and secondary electron generation and transport. The effect of the physical modeling on the evaluated critical dimension is discussed and the absolute CD deviation of the algorithm is determined for different sets of specimen and tool parameters like edge slope angle, beam energy, and electron probe diameter.

Zitierung

Frase, C. G., Gnieser, D., Dirscherl, K., Buhr, E., & Bosse, H. (2007). A new SEM CD operator verified against Monte Carlo simulations. Advanced Lithography 2007, San Jose, Calif., 26, February - 02, March, 2007, USA. https://doi.org/10.1117/12.712503

Exportieren

PTB-Publica Menü

Sprache wechseln: uk flag